Tandem source activation for cvd of films
US-2015368797-A1 · Dec 24, 2015 · US
using internal electrodes
using internal electrodes · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/509 |
| Official title | using internal electrodes |
| Display label | using internal electrodes |
| Total patents | 804 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 68 |
| 2016 | 47 |
| 2017 | 63 |
| 2018 | 63 |
| 2019 | 78 |
| 2020 | 73 |
| 2021 | 77 |
| 2022 | 94 |
| 2023 | 70 |
| 2024 | 71 |
| 2025 | 81 |
| 2026 | 19 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Process chamber, method of preparing a process chamber, and method of operating a process chamber
US-2015357164-A1 · Dec 10, 2015 · US
Electrode plate for plasma etching and plasma etching apparatus
US-2015348762-A1 · Dec 3, 2015 · US
Pair of electrodes for dbd plasma process
US-2015348759-A1 · Dec 3, 2015 · US
Substrate processing apparatus and semiconductor device manufacturing method
US-9175395-B2 · Nov 3, 2015 · US
Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
US-9169561-B2 · Oct 27, 2015 · US
Plasma CVD method
US-9165748-B2 · Oct 20, 2015 · US
Plasma processing apparatus and plasma processing method
US-9165780-B2 · Oct 20, 2015 · US
Resin container coating device
US-2015292089-A1 · Oct 15, 2015 · US
PECVD process
US-9157730-B2 · Oct 13, 2015 · US
Tightly fitted ceramic insulator on large area electrode
US-2015273490-A1 · Oct 1, 2015 · US
Tandem source activation for cyclical deposition of films
US-9145607-B2 · Sep 29, 2015 · US
Oxide semiconductor depositing apparatus and method of manufacturing oxide semiconductor using the same
US-2015270118-A1 · Sep 24, 2015 · US
Deposition apparatus, method of forming thin film using the deposition apparatus, and method of manufacturing organic light emitting display apparatus using the deposition apparatus
US-9142415-B2 · Sep 22, 2015 · US
Plasma CVD apparatus
US-9133547-B2 · Sep 15, 2015 · US
Film forming apparatus, and method of manufacturing semiconductor device
US-2015252479-A1 · Sep 10, 2015 · US
Method for producing gas barrier film, gas barrier film, and electronic device
US-2015247241-A1 · Sep 3, 2015 · US
Super-hydrophobic thin film and method for preparing the same
US-2015240363-A1 · Aug 27, 2015 · US
Electrode plate for plasma etching and plasma etching apparatus
US-9117635-B2 · Aug 25, 2015 · US
Substrate processing device and substrate processing method
US-2015235812-A1 · Aug 20, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/509?
- CPC C23C16/509 is the Cooperative Patent Classification code for “using internal electrodes.”
- How many patents are filed under CPC C23C16/509 (using internal electrodes)?
- Our database includes 804 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/509 growing?
- Publication counts under this code: 71 in 2024 vs 81 in 2025 (latest complete years).