Processing chamber gas delivery system with hot-swappable ampoule

Patent metadata

Field	Value
Publication number	US-9447497-B2
Application number	US-201414209383-A
Country	US
Kind code	B2
Filing date	Mar 13, 2014
Priority date	Mar 13, 2013
Publication date	Sep 20, 2016
Grant date	Sep 20, 2016

Abstract

Disclosed are apparatus and methods for supplying a constant flow of precursor gas to a processing chamber. The apparatus described, and methods of use, allow a precursor ampoule to be removed from the gas delivery system without interrupting the process.

First claim

What is claimed is:

1. A gas delivery system to deliver a gas to a processing chamber, the gas delivery system comprising:
at least two enclosures, each enclosure including:
an inlet line in fluid communication with a carrier gas, the inlet line having an ampoule inlet valve to control the flow of a carrier gas into an ampoule,
an outlet line having an outlet valve to control flow of a precursor and carrier gas exiting an ampoule,
a bypass line downstream of the ampoule outlet valve having a bypass valve, the bypass valve allowing the carrier gas to flow from the inlet line to purge the outlet line without flowing carrier gas into an ampoule,
an exhaust line in fluid communication with the outlet line and downstream of the bypass line, the exhaust line having an exhaust valve to allow a gas flowing in the outlet line to flow to an exhaust,
a trickle purge line in fluid communication with the outlet line and downstream of the bypass line, the trickle purge line having a trickle purge valve to allow a flow of a trickle purge gas into the outlet line;
an enclosure purge line in fluid communication with the purge gas or carrier gas, the enclosure purge line providing a flow of gas into the enclosure;
an enclosure exhaust line in fluid communication with the exhaust line, the enclosure exhaust line exhausting gas within the enclosure; and

a merge connector downstream of the at least two enclosures, the merge connector in fluid communication with the outlet lines from each enclosure and merging a flow of gas in the outlet lines to a processing chamber inlet line.

2. The gas delivery system of claim 1 , wherein the trickle purge line is downstream of the exhaust line and in fluid communication with the outlet line.

3. The gas delivery system of claim 2 , further comprising a second trickle purge valve in fluid communication with the outlet line and positioned downstream of the exhaust line and upstream of the trickle purge line.

4. The gas delivery system of claim 1 , further comprising an exhaust merge connector downstream of the at least two enclosures and in fluid communication with the exhaust lines from each enclosure, the exhaust merge connector merging a flow of gas in the exhaust lines into a single exhaust line.

5. The gas delivery system of claim 1 , further comprising an enclosure purge line in fluid communication with the purge gas or carrier gas, the enclosure purge line providing a flow of gas into the enclosure.

6. The gas delivery system of claim 5 , wherein the enclosure purge line is in fluid communication with the same carrier gas as the inlet line.

7. The gas delivery system of claim 1 , further comprising an enclosure exhaust line in fluid communication with the exhaust line, the enclosure exhaust line exhausting gas within the enclosure.

8. The gas delivery system of claim 1 , wherein the trickle purge line of each enclosure is in fluid communication with a single trickle purge gas source.

9. The gas delivery system of claim 1 , further comprising an ampoule heater.

10. The gas delivery system of claim 1 , wherein the processing chamber inlet line is in fluid communication with a processing chamber.

11. The gas delivery system of claim 10 , wherein each enclosure further comprises a safety interlock in communication with the processing chamber, the safety interlock shutting down the processing chamber if no gas is flowing through the outlet line.

Assignees

• Wu Dien-Yeh
• Johnson Mark S
• Santi David M
• Lam Hyman
• Applied Materials Inc

Inventors

• Wu Dien-Yeh
• Johnson Mark S
• Santi David M
• Lam Hyman

Classifications

• Y10T137/0419

  Fluid cleaning or flushing · CPC title

• C23C16/45561 Primary

  Gas plumbing upstream of the reaction chamber · CPC title

• Y10T137/4259

  With separate material addition · CPC title