Large area deposition and doping of graphene, and products including the same

US9418770B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9418770-B2
Application numberUS-201313942726-A
CountryUS
Kind codeB2
Filing dateJul 16, 2013
Priority dateAug 7, 2009
Publication dateAug 16, 2016
Grant dateAug 16, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Certain example embodiments of this invention relate to the use of graphene as a transparent conductive coating (TCC). In certain example embodiments, graphene thin films grown on large areas hetero-epitaxially, e.g., on a catalyst thin film, from a hydrocarbon gas (such as, for example, C 2 H 2 , CH 4 , or the like). The graphene thin films of certain example embodiments may be doped or undoped. In certain example embodiments, graphene thin films, once formed, may be lifted off of their carrier substrates and transferred to receiving substrates, e.g., for inclusion in an intermediate or final product. Graphene grown, lifted, and transferred in this way may exhibit low sheet resistances (e.g., less than 150 ohms/square and lower when doped) and high transmission values (e.g., at least in the visible and infrared spectra).

First claim

Opening claim text (preview).

What is claimed is: 1. A doped graphene thin film structure including a graphene thin film and a metal catalyst thin film, the doped graphene thin film structure comprising: the doped graphene thin film directly or indirectly on the metal catalyst thin film having a substantially single-orientation large-grain crystal structure, wherein the graphene thin film is 1-10 atomic layers thick, and wherein the doped graphene thin film has a sheet resistance less than 150 ohms/square. 2. The doped graphene thin film structure of claim 1 , wherein the doped graphene thin film includes n-type dopants. 3. The doped graphene thin film structure of claim 1 , wherein the doped graphene thin film includes p-type dopants. 4. The doped graphene thin film structure of claim 1 , wherein the doped graphene thin film is doped with any one or more of: nitrogen, boron, phosphorous, fluorine, lithium, potassium, and sulfur. 5. The doped graphene thin film structure of claim 1 , wherein the doped graphene thin film has a sheet resistance of 10-20 ohms/square.

Assignees

Inventors

Classifications

  • Manufacture or treatment of nanostructures · CPC title

  • by contacting with diffusion materials in the solid state · CPC title

  • by contacting with diffusion materials in the liquid state · CPC title

  • C30B29/02Primary

    Elements · CPC title

  • Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

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What does patent US9418770B2 cover?
Certain example embodiments of this invention relate to the use of graphene as a transparent conductive coating (TCC). In certain example embodiments, graphene thin films grown on large areas hetero-epitaxially, e.g., on a catalyst thin film, from a hydrocarbon gas (such as, for example, C 2 H 2 , CH 4 , or the like). The graphene thin films of certain example embodiments may be doped or undope…
Who is the assignee on this patent?
Guardian Industries
What technology area does this patent fall under?
Primary CPC classification C30B29/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).