Method of manufacturing a projection objective and projection objective

Patent metadata

Field	Value
Publication number	US-9360775-B2
Application number	US-201213364565-A
Country	US
Kind code	B2
Filing date	Feb 2, 2012
Priority date	Nov 30, 2006
Publication date	Jun 7, 2016
Grant date	Jun 7, 2016

Abstract

The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

First claim

What is claimed is:

1. A method, comprising:
computing a numerical value for each of a plurality of merit function components based on a corresponding feature of a preliminary design of a projection objective, wherein each of the plurality of merit function components corresponds to a respective quality parameter;
computing from the merit function components an overall merit function expressible in numerical terms that reflect corresponding quality parameters;
successively varying at least one structural parameter of the design of the projection objective and recomputing a resulting overall merit function value with each successive variation until the resulting overall merit function reaches a predetermined acceptable value at an optimized design of the projection objective; and
obtaining the structural parameters of the optimized design of the projection objective having the predetermined acceptable value for the resulting overall merit function,
further comprising:
defining a number of representative field points;
defining a pupil raster representing an array of mutually spaced apart raster points in a pupil surface of the projection objective;
calculating, for each of the representative field points, ray trajectories of rays of the projection objective originating from the representative field points and passing through the raster points of the pupil raster;
calculating, for each optical surface of a plurality of optical surfaces of the projection objective, intersection points of the rays with the optical surface;
calculating for each optical surface a plurality of gradient parameters representing respective gradients between intersection points corresponding to neighbouring raster points arranged directly adjacent to each other;
defining a gradient threshold value representing a minimum acceptable gradient between neighbouring intersection points; and
optimizing at least one of the structural parameters of the design of the projection objective such that the gradient parameter does not fall below the gradient threshold value for each optical surface of the projection objective except for an optical surface that is a last optical surface of the plurality of optical surfaces in a direction of ray propagation through the projection objective.

2. The method of claim 1 , further comprising using the structural parameters of the optimized design of the projection objective to make the projection objective.

3. A method according to claim 1 , further comprising:
calculating a position and an extent of potential caustic regions within the projection objective; and
optimizing the structural parameters of the design of the projection objective such that no optical surface is positioned inside a caustic region.

4. A method according to claim 1 , wherein the pupil raster is defined such that the pupil surface is subdivided into raster fields having substantially the same raster field area.

5. A method according to claim 1 , wherein the pupil raster is defined in polar coordinates such that neighbouring raster points have the same distance in an azimuthal direction and a pupil angle k varies in steps between 0 and k max =NA·β according to k i =√{square root over (i/n)}k max , where i=0, 1, . . . , n, NA is the image-side numerical aperture of the projection objective, and β is the magnification factor between object field and image field.

6. The method according to claim 1 , wherein the projection objective is a catadioptric projection objective designed to image an off-axis object field arranged in an object surface into an off-axis image field arranged in an image surface, the projection objective comprising:
at least one concave mirror;
at least one intermediate image; and
at least one folding mirror arranged to deflect radiation coming from an object surface towards the concave mirror or arranged to deflect radiation coming from the concave mirror towards the image surface.

7. The method according to claim 6 , wherein the optical elements form:
a first refractive objective part generating a first intermediate image from radiation coming from the object surface and including a first pupil surface;
a second objective part including the at least one concave mirror imaging the first intermediate image into a second intermediate image and including a second pupil surface optically conjugated to the first pupil surface; and
a third refractive objective part imaging the second intermediate image onto the image surface and including a third pupil surface optically conjugated to the first and second pupil surfaces.

8. The method according to claim 7 , wherein the projection objective has exactly two intermediate images and/or wherein the second objective part has exactly one concave mirror and the projection objective has a first folding mirror to deflect radiation coming from the object surface in the direction of the concave mirror, and a second folding mirror to deflect radiation coming from the concave mirror in the direction of the image surface and/or wherein the projection objective is designed for immersion lithography at NA>1.

9. The method of claim 1 , wherein the projection objective is designed to be used in microlithography.

10. A method, comprising:
computing a numerical value for each of a plurality of merit function components based on a corresponding feature of a preliminary design of a projection objective, wherein each of the plurality of merit function components corresponds to a respective quality parameter;
computing from the merit function components an overall merit function expressible in numerical terms that reflect corresponding quality parameters;
successively varying at least one structural parameter of the design of the projection objective and recomputing a resulting overall merit function value with each successive variation until the resulting overall merit function reaches a predetermined acceptable value at an optimized design of the projection objective; and
obtaining the structural parameters of the optimized design of the projection objective having the predetermined acceptable value for the resulting overall merit function,
further comprising:
defining a number of representative field points;
calculating ray bundles originating from the field points and intersection zones of the ray bundles with a plurality of optical surfaces of the projection objective, where an intersection zone of a ray bundle with an optical surface of the plurality of optical surfaces defines a real sub-aperture having a real sub-aperture size defined by the area of the intersection zone;
defining a sub-aperture size threshold value; and
optimizing the structure parameters of the projection objective such that the real sub-aperture size for selected field points does not fall below the sub-aperture size threshold value for all optical surfaces of the projection objective except for a last optical surface of the plurality of optical surfaces directly adjacent to an image surface of the projection objective.

11. The method of claim 10 , further comprising using the structural parameters of the optimized design of the projection objective to make the projection objective.

12. The method of claim 10 , further comprising:
calculating a position and an extent of potential caustic regions within the projection objective; and
optimizing the structural parameters of the design of the projection objective such that no optical surface is positioned inside a caustic region.

13. The method of claim 10 , wherein the projection objective is a catadioptric projection objective designed to image an off-axis object field arranged in an obje

Assignees

• Feldmann Heiko
• Gruner Toralf
• Epple Alexander
• Zeiss Carl Smt Gmbh

Inventors

• Feldmann Heiko
• Gruner Toralf
• Epple Alexander

Classifications

• G03F7/705

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title

• G03F7/70225

  Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements · CPC title

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

• G03F7/70983

  Optical system protection, e.g. pellicles or removable covers for protection of mask · CPC title

• G03F7/70891 Primary

  Temperature · CPC title