Electrolytic electrode, anode for electrolytic production of ozone, anode for electrolytic production of persulfuric acid and anode for electrolytic oxidation of chromium

US9353448B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9353448-B2
Application numberUS-201113823877-A
CountryUS
Kind codeB2
Filing dateSep 14, 2011
Priority dateSep 17, 2010
Publication dateMay 31, 2016
Grant dateMay 31, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An electrolytic electrode includes an electrode surface layer formed by a high-temperature heat treatment under a low oxygen partial pressure of 100 Pa or less and includes a valve metal oxide film, the electrode surface layer having, just beneath, a layer which includes a valve metal and a noble metal excluding silver and the noble metal is precipitated and dispersed in a crystal grain boundary of the valve metal, wherein a crystal of the valve metal in a range of down to 30 μm in a vertical depth direction from the electrode surface is a crystal grain being elongated in a vertical cross-section from the electrode surface and a content of the noble metal in a range of down to 10 μm in the vertical depth direction from the electrode surface is 5 at % or less.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electrolytic electrode, comprising: an electrode surface layer formed by a high-temperature heat treatment under a low oxygen partial pressure of 100 Pa or less, wherein the electrode surface layer includes a valve metal oxide film, an electrode sub-surface layer, positioned beneath the electrode surface layer, which includes a valve metal and a noble metal excluding silver (Ag), wherein the noble metal is precipitated and dispersed in a crystal grain boundary of the valve metal, wherein a region of down to 30 μm in a vertical depth direction from the electrode surface comprises crystal grains arranged in an elongated orientation in a vertical cross-section from the electrode surface, and a region of down to 10 μm in the vertical depth direction from the electrode surface contains 5 at % or less of the noble metal dispersed in the crystal grain boundary of the valve metal. 2. The electrolytic electrode according to claim 1 , wherein the noble metal is a platinum group metal. 3. The electrolytic electrode according to claim 1 , wherein the noble metal is platinum (Pt), iridium (Ir), ruthenium (Ru) or palladium (Pd). 4. The electrolytic electrode according to claim 1 , wherein the region of down to 10 μm in the vertical depth direction from the electrode surface contains from 0.01 to 5 at % of the noble metal. 5. The electrolytic electrode according to claim 1 , wherein the valve metal is titanium (Ti) or zirconium (Zr). 6. The electrolytic electrode according to claim 1 , wherein the thickness of the valve metal oxide film is from 3 to 200 nm. 7. The electrolytic electrode according to claim 1 , which is used as an anode for producing ozone by electrolysis of an aqueous solution. 8. The electrolytic electrode according to claim 1 , which is used as an anode for producing a persulfuric acid by electrolysis of a sulfate ion-containing aqueous solution. 9. The electrolytic electrode according to claim 1 , which is used as an anode for oxidizing trivalent chromium (Cr(III)) to hexavalent chromium (Cr(VI)) in a chromium (Cr) plating bath.

Assignees

Inventors

Classifications

  • C25B11/061Primary

    Metal or alloy · CPC title

  • Valve metal, e.g. titanium · CPC title

  • Metal melt containing the element to be diffused · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Apparatus specially adapted for electrolytic conversion coating (apparatus in general for electrolytic coating C25D17/00) · CPC title

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What does patent US9353448B2 cover?
An electrolytic electrode includes an electrode surface layer formed by a high-temperature heat treatment under a low oxygen partial pressure of 100 Pa or less and includes a valve metal oxide film, the electrode surface layer having, just beneath, a layer which includes a valve metal and a noble metal excluding silver and the noble metal is precipitated and dispersed in a crystal grain boundar…
Who is the assignee on this patent?
Okazaki Tsuyoshi, Ezawa Nobuyasu, Tanaka Precious Metal Ind
What technology area does this patent fall under?
Primary CPC classification C25B11/061. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 31 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).