Electrodeposition system and method incorporating an anode having a back side capacitive element
US-2015376812-A1 · Dec 31, 2015 · US
Method for producing electrode
US2019169762A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2019169762-A1 |
| Application number | US-201716324755-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 8, 2017 |
| Priority date | Aug 12, 2016 |
| Publication date | Jun 6, 2019 |
| Grant date | — |
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Abstract
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The method for producing an electrode includes the steps of dissolving a soluble salt of nickel, a soluble salt of iron, and aminocarboxylic acid in water to prepare a plating solution, and immersing a substrate in the plating solution to form a plating on the substrate by electroplating. In the step of forming of the plating, the pH of the plating solution is more than 2.0.
First claim
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1 . A method for producing an electrode, the method including the steps of: dissolving a soluble salt of nickel, a soluble salt of iron, and aminocarboxylic acid in water to prepare a plating solution, and immersing a substrate in the plating solution to form a plating on the substrate by electroplating, wherein in the step of forming of the plating, the pH of the plating solution is more than 2.0. 2 . The method for producing an electrode according to claim 1 , wherein the plating solution has an aminocarboxylic acid concentration of 0.20 mol/L or more. 3 . The method for producing an electrode according to claim 1 , wherein the step of preparing the plating solution further include dissolving a soluble salt of cobalt.
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- What does patent US2019169762A1 cover?
- The method for producing an electrode includes the steps of dissolving a soluble salt of nickel, a soluble salt of iron, and aminocarboxylic acid in water to prepare a plating solution, and immersing a substrate in the plating solution to form a plating on the substrate by electroplating. In the step of forming of the plating, the pH of the plating solution is more than 2.0.
- Who is the assignee on this patent?
- Hitachi Shipbuilding Eng Co
- What technology area does this patent fall under?
- Primary CPC classification C25D3/56. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Jun 06 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).