Compact ampoule thermal management system

US9347696B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9347696-B2
Application numberUS-201313902304-A
CountryUS
Kind codeB2
Filing dateMay 24, 2013
Priority dateJun 5, 2012
Publication dateMay 24, 2016
Grant dateMay 24, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus for thermal management of a precursor for use in substrate processing, comprising: a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material, wherein the body comprises two separable parts, and wherein the opening is at least partially formed in each of the two separable parts; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices. 2. The apparatus of claim 1 , wherein the body is made of aluminum, copper or brass. 3. The apparatus of claim 1 , further comprising: a thermally insulative material disposed on one or more outer surfaces of the body. 4. The apparatus of claim 1 , further comprising: a thermally conductive plate coupled to each part of the body on at least one of a first side of the body or a second side of the body, opposite the first side. 5. The apparatus of claim 4 , further comprising: a thermally insulative material disposed on an outer surface of the thermally conductive plate. 6. The apparatus of claim 1 , wherein the one or more thermoelectric devices comprises at least two thermoelectric devices, wherein at least one thermoelectric device is disposed on opposing sides of the body proximate the opening. 7. The apparatus of claim 6 , wherein the at least two thermoelectric devices comprises four thermoelectric devices disposed on opposing sides of the body proximate the opening. 8. The apparatus of claim 1 , wherein the one or more thermoelectric devices comprise at least two thermoelectric devices stacked atop one another to provide a thermal gradient across the body. 9. The apparatus of claim 1 , wherein the storage container comprises one or more ports configured to be coupled to conduits for providing the liquid or solid precursor to the storage container. 10. The apparatus of claim 1 , further comprising: a thermally insulative material disposed between the heat sink and the body such that the heat sink is substantially only thermally coupled to the one or more thermoelectric devices. 11. The apparatus of claim 1 , wherein the one or more thermoelectric devices are at least partially set into the body, and wherein the body further comprises one or more recesses formed in the body configured to route electrical cables for operation of the one or more thermoelectric devices. 12. The apparatus of claim 1 , further comprising: a thermocouple coupled to the body to measure a temperature of the storage container. 13. An apparatus for thermal management of a precursor for use in substrate processing, comprising: a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material wherein the storage container comprises one or more ports configured to be coupled to conduits for providing the liquid or solid precursor to the storage container; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices. 14. An apparatus for thermal management of a precursor for use in substrate processing, comprising: a body fabricated from a thermally conductive material, the body comprising two separable parts and an opening sized to receive a storage container at least partially formed in each of the two separable parts, wherein the storage container is configured to contain a liquid or solid precursor; one or more thermoelectric devices coupled to the body proximate the opening; a heat sink coupled to the one or more thermoelectric devices; and a thermally conductive plate coupled to each of the two separable parts of the body on a first side of the body and a second side of the body, opposite the first side. 15. The apparatus of claim 14 , further comprising: a thermally insulative material disposed on one or more outer surfaces of the body. 16. The apparatus of claim 15 , further comprising: a thermally insulative material disposed on an outer surface of the thermally conductive plate. 17. The apparatus of claim 14 , further comprising: a thermally insulative material disposed between the heat sink and the body such that the heat sink is substantially only thermally coupled to the one or more thermoelectric devices. 18. The apparatus of claim 14 , wherein the storage container comprises one or more ports configured to be coupled to conduits for providing the liquid or solid precursor to the storage container. 19. The apparatus of claim 14 , wherein the one or more thermoelectric devices comprise at least two thermoelectric devices stacked atop one another to provide a thermal gradient across the body.

Assignees

Inventors

Classifications

  • by bubbling of carrier gas through liquid source material · CPC title

  • C23C16/448Primary

    characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

  • F25B21/02Primary

    using Peltier effect; using Nernst-Ettinghausen effect · CPC title

  • Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

  • Apparatus for thermal treatment · CPC title

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What does patent US9347696B2 cover?
Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or mo…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/448. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 24 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).