Chemical-liquid mixing method and chemical-liquid mixing apparatus

Patent metadata

Field	Value
Publication number	US-9339775-B2
Application number	US-201514750319-A
Country	US
Kind code	B2
Filing date	Jun 25, 2015
Priority date	Aug 3, 2006
Publication date	May 17, 2016
Grant date	May 17, 2016

Abstract

The present invention provides a chemical-liquid mixing method and a chemical-liquid mixing apparatus capable of sufficiently generating a peroxornonosulfuric acid that is effective in removing a resist from a substrate, when a sulfuric acid and a hydrogen peroxide solution are mixed with each other. At first, an inner tank 10 is filled up with a sulfuric acid and the sulfuric acid overflowing from the inner tank 10 is allowed to flow into an outer tank 12 . Then, a hydrogen peroxide solution is supplied into the inner tank 10 and the hydrogen peroxide solution is allowed to flow into the outer tank 12 whereby the two kinds of liquids of the hydrogen peroxide solution and the sulfuric acid are stored in the outer tank 12 . Simultaneously when the hydrogen peroxide solution flows into the outer tank 12 , a return pump 16 is activated.

First claim

The invention claimed is:

1. A chemical-liquid mixing apparatus for mixing a sulfuric acid and a hydrogen peroxide solution, the apparatus comprising:
an inner tank;
an outer tank disposed around the inner tank, into which outer tank a liquid overflowing from the inner tank flows;
a return pipe configured to return the liquid in the outer tank to the inner tank; and
a return pump provided on the return pipe for sending the liquid in the outer tank to the inner tank;
a heater provided on the return pipe;
a sulfuric-acid supply unit configured to supply a sulfuric acid into the inner tank;
a hydrogen-peroxide-solution supply unit configured to supply a hydrogen peroxide solution to the inner tank or the outer tank;
a hydrogen-peroxide-solution replenishing pipe for replenishing a hydrogen peroxide solution that extends through the outer tank to reach an inside of the return pipe such that a hydrogen peroxide solution can be directly fed into the return pipe, with an outlet of the replenishing pipe downstream in the return pipe from an inlet of the return pipe; and
a controller configured to control the sulfuric-acid supply unit, the hydrogen-peroxide-solution supply unit, and the return pump, the controller controlling at first the sulfuric-acid supply unit to fill the inner tank with a sulfuric acid, allowing the sulfuric acid overflowing from the inner tank to flow into the outer tank, then the controller controlling the hydrogen-peroxide-solution supply unit to supply a hydrogen peroxide solution into the inner tank or the outer tank, allowing the hydrogen peroxide solution to flow into the outer tank whereby the two kinds of liquids of the hydrogen peroxide solution and the sulfuric acid are stored in the outer tank, and the controller activating the return pump simultaneously with a start of an activation of the hydrogen-peroxide-solution supply unit.

2. The chemical-liquid mixing apparatus according to claim 1 , wherein
the controller is operable to control the heater such that the heater is activated after a preset period of time has passed from the activation of the return pump.

3. The chemical-liquid mixing apparatus according to claim 1 , wherein
the replenishing pipe is configured to supply hydrogen peroxide solution to the return pipe with the supplied hydrogen peroxide solution being received at the return pipe without first passing through the inner tank.

4. The chemical-liquid mixing apparatus according to claim 3 , wherein
the replenishing pipe is configured to supply hydrogen peroxide solution to the return pipe with the supplied hydrogen peroxide solution being received at the return pipe without first contacting a liquid in the outer tank.

5. The chemical-liquid mixing apparatus according to claim 1 , wherein
the replenishing pipe is configured to supply hydrogen peroxide solution to the return pipe with the supplied hydrogen peroxide solution being received at the return pipe without first contacting a liquid in the outer tank.

Assignees

• Tokyo Electron Ltd

Inventors

• Tanaka Hiroshi
• Hiroshiro Koukichi
• Kamimura Fumihiro

Classifications

• H10P72/0416

  with the semiconductor substrates being dipped in baths or vessels · CPC title

• C01B15/08 Primary

  Peroxysulfates · CPC title

• B01F15/00253

  Operations & Transport · mapped topic

• B01F15/0437

  Operations & Transport · mapped topic

• B01F15/0412

  Operations & Transport · mapped topic