Circuit board structure and manufacturing method thereof
US-2024138063-A1 · Apr 25, 2024 · US
US9338897B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9338897-B2 |
| Application number | US-201314133238-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 18, 2013 |
| Priority date | Dec 19, 2012 |
| Publication date | May 10, 2016 |
| Grant date | May 10, 2016 |
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A ceramic substrate is provided that includes a ceramic substrate main body including a principal surface, a connecting terminal portion disposed on the principal surface of the ceramic substrate main body that is capable of being connected to another component via solder, the connecting terminal portion including a copper layer and a coating metal layer covering a surface of the copper layer; a contact layer of titanium or chromium disposed between the ceramic substrate main body and the connecting terminal portion; and an intermediate layer disposed between the copper layer of the connecting terminal portion and the contact layer, the intermediate layer including one of a titanium-tungsten alloy, a nickel-chromium alloy, tungsten, palladium, and molybdenum. The contact layer and the intermediate layer are set back from a side surface of the copper layer in a substrate plane direction.
Opening claim text (preview).
What is claimed is: 1. A ceramic substrate comprising: a ceramic substrate main body including a principal surface; a connecting terminal portion disposed on the principal surface of the ceramic substrate main body for connecting to a component via solder, the connecting terminal portion including a copper layer and a coating metal layer covering a surface of the copper layer; a contact layer of titanium or chromium disposed between the ceramic substrate main body and the connecting terminal portion; an intermediate layer disposed between the copper layer of the connecting terminal portion and the contact layer, the intermediate layer including one of a titanium-tungsten alloy, a nickel-chromium alloy, tungsten, palladium, and molybdenum; and a metallized metal layer disposed on the principal surface of the ceramic substrate main body, wherein the contact layer and the intermediate layer are set back from a side surface of the copper layer in a substrate plane direction; the metallized metal layer is coated with a protection layer for protecting from an etching solution for etching the contact layer; and at least a portion of the contact layer is formed on the protection layer. 2. The ceramic substrate according to claim 1 , wherein a part of the metallized metal layer coated with the protection layer is extended from a projected area of the connecting terminal portion. 3. The ceramic substrate according to claim 1 , further comprising: an end-face through-hole conductor including a metallized metal and disposed on a side surface of the ceramic substrate main body, wherein a surface of the end-face through-hole conductor is coated with the protection layer. 4. The ceramic substrate according to claim 1 , wherein the coating metal layer includes at least nickel. 5. The ceramic substrate according to claim 1 , wherein the coating metal layer includes nickel and gold or includes nickel, palladium, and gold. 6. A method of manufacturing the ceramic substrate according to claim 1 , the method comprising: a firing step of forming the ceramic substrate main body and the metallized metal layer; a protection layer-forming step of forming the protection layer by performing nickel plating on the metallized metal layer exposed on the principal surface side of the ceramic substrate main body; a contact layer-forming step of forming the contact layer on a surface of the protection layer and on the principal surface of the ceramic substrate main body; an intermediate layer-forming step of forming the intermediate layer on a surface of the contact layer; a copper layer-forming step of forming the copper layer of the connecting terminal portion on a surface of the intermediate layer by copper plating; an etching step of removing the intermediate layer and the contact layer that are exposed on the principal surface side of the ceramic substrate main body in a stepwise manner or simultaneously by etching, while protecting the metallized metal layer from corrosion due to an etching solution by the protection layer; and a coating metal layer-forming step of forming the coating metal layer on the surface of the copper layer by successively performing nickel and gold plating, or nickel, palladium, and gold plating.
Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors · CPC title
Inorganic insulating substrates, e.g. ceramic, glass · CPC title
Chemical vapour deposition · CPC title
by the use of a metallic or inorganic thin film adhesion layer · CPC title
Surface contacts, e.g. bumps (H05K3/4092 takes precedence; deposition of finish layers on pads H05K3/24; forming solder bumps H05K3/3465) · CPC title
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