High productivity spray processing for the metallization of semiconductor workpieces

Patent metadata

Field	Value
Publication number	US-9337374-B2
Application number	US-201213726169-A
Country	US
Kind code	B2
Filing date	Dec 23, 2012
Priority date	Dec 23, 2011
Publication date	May 10, 2016
Grant date	May 10, 2016

Abstract

Processing equipment for the metallization of a plurality of semiconductor workpieces. A controlled atmospheric non-oxidizing gas region comprises at least two enclosed deposition zones, the controlled atmospheric non-oxidizing gas region is isolated from external oxidizing ambient. A temperature controller adjusts the temperature of the semiconductor workpiece in each of the at least two enclosed deposition zones. Each of the enclosed deposition zones comprising at least one spray gun for the metallization of the semiconductor workpiece. A transport system moves the semiconductor workpiece through the controlled atmospheric non-oxidizing gas region. A batch carrier plate carries the semiconductor workpiece through the controlled atmospheric non-oxidizing gas region. The controlled atmospheric non-oxidizing gas region further comprises a gas-based pre-cleaning zone.

First claim

What is claimed is:

1. Processing equipment for the metallization of a plurality of semiconductor workpieces, comprising:
a controlled atmospheric non-oxidizing gas region comprising at least two enclosed deposition zones, said controlled atmospheric non-oxidizing gas region isolated from external oxidizing ambient;
a temperature controller adjusting the temperature of said semiconductor workpiece in each of said at least two enclosed deposition zones;
each of said enclosed deposition zones comprising at least one spray gun for the metallization of said semiconductor workpiece;
a transport system moving said semiconductor workpiece through said controlled atmospheric non-oxidizing gas region; and
a batch carrier plate carrying said semiconductor workpiece through said controlled atmospheric non-oxidizing gas region gas region;
wherein said controlled atmospheric non-oxidizing gas region further comprises a pre-cleaning zone,
wherein said pre-cleaning zone is a gas based pre-cleaning zone.

2. The processing equipment of claim 1 , further comprising a shadow mask exposing and defining a metallization pattern on said semiconductor workpiece.

3. The processing equipment of claim 2 , wherein said shadow mask is a discrete patterned mask positioned on said semiconductor workpiece.

4. The processing equipment of claim 2 , further comprising an integrated mask cleaning system.

5. The processing equipment of claim 2 , wherein said shadow mask are strips arranged in a roll-to-roll arrangement.

6. The processing equipment of claim 2 , wherein said shadow mask are strips arranged in a continuous strips arrangement.

7. The processing equipment of claim 6 , further comprising a strips cleaning segment.

8. The processing equipment of claim 1 , wherein said controlled atmospheric non-oxidizing gas region comprises at least three enclosed deposition zones.

9. The processing equipment of claim 1 , wherein said controlled atmospheric non-oxidizing gas region further comprises a pre-cleaning zone.

10. The processing equipment of claim 9 , wherein said pre-cleaning zone is a gas based pre-cleaning zone.

Assignees

• Solexel Inc

Inventors

• Kramer Karl-Josef
• Ashjaee Jay
• Moslehi Mehrdad M
• Calcaterra Anthony
• Dutton David
• Kapur Pawan
• Seutter Sean
• Fatemi Homi

Classifications

• H10F19/908

  for back-contact photovoltaic cells · CPC title

• H10F71/1375 Primary

  Apparatus for automatic interconnection of photovoltaic cells in a module · CPC title

• H10F71/00 Primary

  Manufacture or treatment of devices covered by this subclass (patterning processes to connect thin photovoltaic cells in integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/33; manufacture or treatment of encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/80; manufacture or treatment of integrated devices, or assemblies of multiple devices, comprising at least one element in which radiation controls the flow of current H10F39/00) · CPC title

• H01L31/0516

  Electricity · mapped topic

• H01L31/188

  Electricity · mapped topic