Plasma processing systems including side coils and methods related to the plasma processing systems

Patent metadata

Field	Value
Publication number	US-9336996-B2
Application number	US-201113034332-A
Country	US
Kind code	B2
Filing date	Feb 24, 2011
Priority date	Feb 24, 2011
Publication date	May 10, 2016
Grant date	May 10, 2016

Abstract

A plasma processing system for generating plasma to process a wafer. The plasma processing system includes a set of top coils for initiating the plasma, a set of side coils for affecting distribution of the plasma, and a chamber structure for containing the plasma. The chamber structure includes a chamber wall and a dielectric member. The dielectric member includes a top, a vertical wall, and a flange. The top is connected through the vertical wall to the flange, and is connected through the vertical wall and the flange to the chamber wall. The set of top coils is disposed above the top. The set of side coils surrounds the vertical wall. A vertical inner surface of the vertical wall is configured to be exposed to the plasma. The inner diameter of the vertical wall is smaller than the inner diameter of the chamber wall.

First claim

What is claimed is:

1. A plasma processing system for generating plasma to process at least a wafer and for optimizing distribution of generated plasma on the wafer, the plasma processing system comprising:
a chuck for supporting said wafer;
a chamber structure for containing said plasma, said chamber structure including a cylindrical chamber wall, said chamber structure further including a dielectric member disposed above said cylindrical chamber wall and coupled with said cylindrical chamber wall, said dielectric member comprising a one-piece structure having a top, a vertical wall and a flange as integral parts of the dielectric member, wherein the dielectric member is coupled to said cylindrical wall through said flange, wherein the flange includes a plurality of channels for transmitting one or more gases into the chamber structure, and wherein the top is disposed over said chuck;
a set of top coils disposed above said top for initiating generation of said plasma, a horizontal bottom surface of said top being configured to be exposed to said plasma when said wafer is processed with said plasma;
a set of side coils surrounding said vertical wall and disposed over at least a portion of said flange for affecting distribution of said plasma; and
a shielding arrangement disposed between the set of side coils and the flange, a vertical inner surface of said vertical wall being configured to be exposed to said plasma when said wafer is processed with said plasma, the inner diameter of said vertical wall being smaller than the inner diameter of said cylindrical chamber wall;
wherein the shielding arrangement is at least part of a gas manifold coupled with said flange for delivering said one or more gases to said plurality of channels, and wherein the shielding arrangement shields the plurality of channels from a magnetic field associated with the set of side coils.

2. The plasma processing system of claim 1 , further comprising:
a first generator electrically connected to said set of top coils for powering said set of top coils; and
a second generator electrically connected to said set of side coils for powering said set of side coils.

3. The plasma processing system of claim 2 , wherein the first generator and the second generator are configured to simultaneously provide a frequency of signal to the set of top coils that is at least 3× greater than the frequency of signal to the set of side coils.

4. The plasma processing system of claim 2 , wherein the first generator is configured to provide higher frequency of signal to the set of top coils than the second generator is configured to provide, simultaneously as frequency of signal to the set of side coils.

5. The plasma processing system of claim 2 , wherein the first generator is configured to provide a signal of 13.56 MHz to the set of top coils and the second generator is configured to simultaneously provide a signal in the range from 500 KHz to 4 MHz to the set of side coils.

6. The plasma processing system of claim 1 , further comprising a positioning mechanism for moving set of side coils along a vertical outer surface of said vertical wall.

7. The plasma processing system of claim 1 , wherein the dielectric member comprises a ceramic material.

8. The plasma processing system of claim 7 , wherein the ceramic material comprises aluminum oxide or aluminum nitride.

9. The plasma processing system of claim 7 , wherein the ceramic material comprises aluminum oxide.

10. The plasma processing system of claim 1 , wherein the top of dielectric member comprises a horizontal bottom surface configured to be exposed to plasma for confining plasma under the top of the dielectric member to process the wafer.

11. The plasma processing system of claim 1 , wherein the inner diameter of the set of side coils is larger than the outer diameter of the set of top coils to prevent interference between the set of side coils and the set of top coils.

12. The plasma processing system of claim 1 , wherein the plurality of channels include inner walls having a corrosion-resistant coating material.

13. A plasma processing system for generating plasma to process at least a wafer and for optimizing distribution of generated plasma on the wafer, the plasma processing system comprising:
a chuck for supporting said wafer;
a chamber structure for containing said plasma, said chamber structure including a cylindrical chamber wall, said chamber structure further including a dielectric member disposed above said cylindrical chamber wall and coupled with said cylindrical chamber wall, said dielectric member comprising a one-piece structure having a top, a vertical wall and a flange as integral parts of the dielectric member, wherein the dielectric member is coupled to said cylindrical wall through said flange, wherein the flange includes a plurality of channels for transmitting one or more gases into the chamber structure, and wherein the top is disposed over said chuck;
a set of top coils disposed above said top for initiating generation of said plasma, a horizontal bottom surface of said top being configured to be exposed to said plasma when said wafer is processed with said plasma;
a set of side coils surrounding said vertical wall and disposed over at least a portion of said flange for affecting distribution of said plasma; and
a shielding arrangement disposed between the set of side coils and the flange, a vertical inner surface of said vertical wall being configured to be exposed to said plasma when said wafer is processed with said plasma, the inner diameter of said vertical wall being smaller than the inner diameter of said cylindrical chamber wall;

wherein:
the shielding arrangement is at least part of a gas manifold coupled with said flange for delivering said one or more gases to said plurality of channels, and wherein the shielding arrangement shields the plurality of channels from a magnetic field associated with the set of side coils;
said gas manifold includes an indentation structure, and
at least a portion of said set of side coils is disposed inside said indentation structure.

14. The plasma processing system of claim 13 , wherein the indentation structure is disposed in the gas manifold proximal to the vertical wall.

15. A plasma processing system for generating plasma to process at least a wafer and for optimizing distribution of generated plasma on the wafer, the plasma processing system comprising:
a chuck for supporting said wafer;
a chamber structure for containing said plasma, said chamber structure including a cylindrical chamber wall, said chamber structure further including a dielectric member disposed above said cylindrical chamber wall and coupled with said cylindrical chamber wall, said dielectric member comprising a one-piece structure having a top, a vertical wall and a flange as integral parts of the dielectric member, wherein the dielectric member is coupled to said cylindrical wall through said flange, wherein the flange includes a plurality of channels for transmitting one or more gases into the chamber structure, and wherein the top is disposed over said chuck;
a set of top coils disposed above said top for initiating generation of said plasma, a horizontal bottom surface of said top being configured to be exposed to said plasma when said wafer is processed with said plasma;
a set of side coils surrounding said vertical wall and disposed over at least a portion of said flange for affecting distribution of said plasma; and
a shielding arrangement disposed between the set of side coils and the flange, a vertical inner surface of said vertical wa

Assignees

• Long Maolin
• Paterson Alex
• Lam Res Corp

Inventors

• Long Maolin
• Paterson Alex

Classifications

• H10P50/242 Primary

  of Group IV materials · CPC title

• H05H2001/4652

  Electricity · mapped topic

• H01J37/32119

  Windows · CPC title

• H01J37/32513

  Sealing means, e.g. sealing between different parts of the vessel · CPC title

• H01J37/32458

  Vessel · CPC title