Method for producing chlorosilane gas using continuous tubular reactor
US-10301182-B2 · May 28, 2019 · US
Process for producing trichlorosilane
US9321653B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9321653-B2 |
| Application number | US-201113576690-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 9, 2011 |
| Priority date | Feb 18, 2010 |
| Publication date | Apr 26, 2016 |
| Grant date | Apr 26, 2016 |
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Abstract
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[Problems] To provide a process for efficiently producing trichlorosilane on an industrial scale by efficiently reusing the waste gas of after trichlorosilane is separated by condensation from the gas that is formed by the reaction of metallic silicon with hydrogen chloride. [Means for Solution] A process for producing trichlorosilane, including, independently from each other, a first production process for forming trichlorosilane by reacting metallic silicon with hydrogen chloride and a second production process for forming trichlorosilane by reacting metallic silicon with tetrachlorosilane and hydrogen; wherein trichlorosilane and other chlorosilane compounds are separated by condensation from trichlorosilane-containing gases formed by reaction in the first production process, and the waste gas from which trichlorosilane and other chlorosilane compounds have been separated by condensation is fed as a hydrogen source to the second production process.
First claim
Opening claim text (preview).
The invention claimed is: 1. A process for producing trichlorosilane, including, independently from each other, a first production process for forming said trichlorosilane by reacting metallic silicon with hydrogen chloride and a second production process for forming said trichlorosilane by reacting metallic silicon with tetrachlorosilane and hydrogen; wherein said trichlorosilane and other chlorosilane compounds are separated by condensation from trichlorosilane-containing gases formed by reaction in said first production process, and waste gases from which said trichlorosilane and other chlorosilane compounds have been separated by condensation are continuously fed without being refined as a hydrogen source to the second production process, wherein the metallic silicon is used in the first production process in an amount not less than twice as much as the amount of the metallic silicon used in the second production process. 2. The process for producing trichlorosilane according to claim 1 , wherein said trichlorosilane is separated by condensation from trichlorosilane-containing gases formed by reaction in said second production process.
Assignees
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Classifications
from silicon · CPC title
Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof · CPC title
- C01B33/10763Primary
from silicon · CPC title
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- What does patent US9321653B2 cover?
- [Problems] To provide a process for efficiently producing trichlorosilane on an industrial scale by efficiently reusing the waste gas of after trichlorosilane is separated by condensation from the gas that is formed by the reaction of metallic silicon with hydrogen chloride. [Means for Solution] A process for producing trichlorosilane, including, independently from each other, a first pro…
- Who is the assignee on this patent?
- Akiyoshi Ayao, Aimoto Tadashi, Tokuyama Corp
- What technology area does this patent fall under?
- Primary CPC classification C01B33/10763. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).