Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance

US9303207B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9303207-B2
Application numberUS-201414295262-A
CountryUS
Kind codeB2
Filing dateJun 3, 2014
Priority dateAug 28, 2012
Publication dateApr 5, 2016
Grant dateApr 5, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.

First claim

Opening claim text (preview).

What is claimed is: 1. A texturing composition consisting of one or more compounds chosen from hydantoin and hydantoin derivatives, one or more alkoxylated glycols and one or more alkaline compounds selected from the group consisting of potassium hydroxide, sodium hydroxide, lithium hydroxide, quaternary ammonium hydroxides, ammonium hydroxide and alkanolamines, and one or more organic solvents having a flash point of 75° C. or greater, water and optionally one or more oxygen scavengers. 2. The composition of claim 1 , wherein the one or more of hydantoin and hydantoin derivatives range from 0.001 wt % to 1 wt % of the composition.

Assignees

Inventors

Classifications

  • H10F77/703Primary

    of the semiconductor bodies, e.g. textured active layers · CPC title

  • Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules · CPC title

  • Surface textures, e.g. pyramid structures · CPC title

  • H10F71/00Primary

    Manufacture or treatment of devices covered by this subclass (patterning processes to connect thin photovoltaic cells in integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/33; manufacture or treatment of encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/80; manufacture or treatment of integrated devices, or assemblies of multiple devices, comprising at least one element in which radiation controls the flow of current H10F39/00) · CPC title

  • containing an alkali metal hydroxide · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9303207B2 cover?
Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the l…
Who is the assignee on this patent?
Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification H10F77/703. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).