Photosensitive bismaleimide composition
US-11639398-B2 · May 2, 2023 · US
This page is not indexed by search engines while we improve data quality.
Barr Robert K patents
Barr Robert K is listed as an inventor on 27 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Barr Robert K |
| Total patents | 27 |
| First publication | Feb 26, 2015 |
| Latest publication | May 2, 2023 |
Notable patents
Publications ranked by popularity score, then publication date.
Polymeric resin for dielectric applications
US-11603422-B2 · Mar 14, 2023 · US
Methods of manufacturing printed wire boards
US-11337309-B2 · May 17, 2022 · US
Photosensitive bismaleimide composition
US-2021198389-A1 · Jul 1, 2021 · US
Polymeric resin for dielectric applications
US-2021198395-A1 · Jul 1, 2021 · US
Printed wire boards, methods of manufacture thereof and articles comprising the same
US-2020296837-A1 · Sep 17, 2020 · US
Imaging three dimensional substrates using a transfer film
US-10583459-B2 · Mar 10, 2020 · US
Addition polymers from nitrogen heterocycle containing monomers and vinyl arylcyclobutene-containing monomers
US-2019127505-A1 · May 2, 2019 · US
Low temperature curable addition polymers from vinyl arylcyclobutene-containing monomers and methods for making the same
US-2019127506-A1 · May 2, 2019 · US
Arylcyclobutenes
US-10030165-B2 · Jul 24, 2018 · US
Recent patents
Latest publications not already listed above.
Polycrystalline texturing composition and method
US-9663715-B2 · May 30, 2017 · US
Hot melt compositions with improved etch resistance
US-9611402-B2 · Apr 4, 2017 · US
Arylcyclobutenes
US-2017081550-A1 · Mar 23, 2017 · US
Hot melt compositions with improved etch resistance
US-9598590-B2 · Mar 21, 2017 · US
Method of cleaning and micro-etching semiconductor wafers
US-2017069480-A9 · Mar 9, 2017 · US
Inkjet printable etch resist
US-9583669-B2 · Feb 28, 2017 · US
Hot melt compositions with improved etch resistance
US-9453139-B2 · Sep 27, 2016 · US
Arylcyclobutenes
US-9441055-B1 · Sep 13, 2016 · US
Method of cleaning and micro-etching semiconductor wafers
US-2016225606-A1 · Aug 4, 2016 · US
Hot melt compositions with improved etch resistance
US-2016137860-A1 · May 19, 2016 · US
Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
US-9303207-B2 · Apr 5, 2016 · US
Hot melt compositions with improved etch resistance
US-2016066430-A1 · Mar 3, 2016 · US
Pre-applied underfill
US-2015371916-A1 · Dec 24, 2015 · US
Inhibiting background plating
US-9206520-B2 · Dec 8, 2015 · US
Method of stripping hot melt etch resists from semiconductors
US-9130110-B2 · Sep 8, 2015 · US
Imaging three dimensional substrates using a transfer film
US-2015182997-A1 · Jul 2, 2015 · US
Hot melt compositions with improved etch resistance
US-2015053643-A1 · Feb 26, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Mat | 21 |
| Barr Robert K | 4 |
| Sun Chemical Corp | 4 |
| Dong Hua | 3 |
| Dow Global Technologies Llc | 3 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09D135/02 | 9 |
| C08F212/08 | 8 |
| C09D11/34 | 7 |
| C09D125/18 | 7 |
| C08F212/32 | 7 |