Imaging using metamaterials

Patent metadata

Field	Value
Publication number	US-9298060-B2
Application number	US-201314047459-A
Country	US
Kind code	B2
Filing date	Oct 7, 2013
Priority date	Dec 20, 2011
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

A system for imaging an object is provided. The system includes a light source configured to emit light having a predetermined wavelength towards the object. The system further includes a metalens including a metallic film having a plurality of slits defined therethrough, the plurality of slits having a width a and a periodicity d that are both less than the predetermined wavelength, wherein the object is positioned between the light source and the metalens. The system further includes a detector configured to acquire measurements indicative of light transmitted through the metalens, and a computing device communicatively coupled to the detector and configured to reconstruct an image of the object based on the acquired measurements.

First claim

What is claimed is:

1. A method for imaging an object, said method comprising:
positioning the object between a light source and a metalens, wherein the metalens includes a metallic film having a plurality of slits defined therethrough, the plurality of slits having a width a and a periodicity d;
emitting light from the light source towards the object, wherein the emitted light has a predetermined wavelength greater than the width a and the periodicity d;
acquiring, using a detector, measurements indicative of light transmitted through the metalens; and
reconstructing, using a computing device communicatively coupled to the detector, an image of the object based on the acquired measurements.

2. A method in accordance with claim 1 , wherein positioning the object comprises positioning the object such that at least a portion of the object lies within evanescent bulges formed at ends of the plurality of slits.

3. A method in accordance with claim 1 , further comprising locating a plurality of dielectric elements within the plurality of slits.

4. A method in accordance with claim 3 , wherein locating a plurality of dielectric elements comprises locating a plurality of substantially optically transparent dielectric elements.

5. A method in accordance with claim 1 , wherein reconstructing an image comprises reconstructing an image having a resolution at least a factor of two smaller than the predetermined wavelength.

6. A method in accordance with claim 1 , wherein the detector is positioned proximate a detection slit of the plurality of slits.

7. A method in accordance with claim 1 , further comprising positioning a waveguide between the metalens and the detector.

Assignees

• Univ Washington

Inventors

• Shen Jung-Tsung
• Shen Yuecheng
• Wang Lihong

Classifications

• H04N23/56

  provided with illuminating means · CPC title

• G01Q60/22 Primary

  Probes, their manufacture, or their related instrumentation, e.g. holders · CPC title

• G02F1/3501 Primary

  Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals · CPC title