Electrostatic chucking device

US9287156B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9287156-B2
Application numberUS-201414155591-A
CountryUS
Kind codeB2
Filing dateJan 15, 2014
Priority dateJan 18, 2013
Publication dateMar 15, 2016
Grant dateMar 15, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11 , a top surface 11 a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to the electrostatic adsorption electrode 12 ; and a base portion 31 that supports the electrostatic chucking portion 2 , in which the plate-like body 11 is a corrosion-resistant ceramic, a circular insulation member 21 is provided in a circumferential edge portion between the electrostatic chucking portion 2 and the base portion 31 , and a heat radiation plate 34 is provided on the top surface 31 a of the base portion 31.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electrostatic chucking device comprising: an electrostatic chucking portion which includes a plate-like body, a principal surface of which is used as a mounting surface that mounts a plate-like specimen, an electrostatic adsorption electrode provided in the plate-like body and a power-feeding terminal that applies a direct-current voltage on the electrostatic adsorption electrode; and a base stage that is provided on the other principal surface and supports the electrostatic chucking portion, wherein the plate-like body is made of a corrosion-resistant ceramic, and a circular insulation member is provided in a circumferential edge portion between the electrostatic chucking portion and the base stage, and a heat radiation plate is provided on a principal surface of the base stage on an electrostatic chucking portion side. 2. The electrostatic chucking device according to claim 1 , wherein the corrosion-resistant ceramic is made of one or two or more selected from a group consisting of yttrium aluminum oxide composite oxides, rare earth element-added yttrium aluminum oxide composite oxides and yttrium oxide. 3. The electrostatic chucking device according to claim 1 , wherein the heat radiation plate is made of metal or an organic resin having thermal conductivity. 4. The electrostatic chucking device according to claim 1 , wherein the mounting surface includes a plurality of protrusion portions having a diameter smaller than the thickness of the plate-like specimen. 5. The electrostatic chucking device according to claim 1 , wherein the surface roughness Ra of an end surface of the power-feeding terminal on an electrostatic adsorption electrode side is in a range of 0.05 μm to 1.0 μm. 6. The electrostatic chucking device according to claim 1 , wherein an insulation layer is provided under the electrostatic adsorption electrode, and the insulation layer and the heat radiation plate are adhered to each other via an organic adhesive layer. 7. The electrostatic chucking device according to claim 6 , wherein the circular insulation member is provided to surround the electrostatic adsorption electrode, the organic adhesive layer and the heat radiation plate, and the distance between the electrostatic adsorption electrode and the base stage is larger than the distance between the circular insulation member and the base stage. 8. The electrostatic chucking device according to claim 1 , wherein the circular insulation member is made of an insulating ceramic which has a thermal conductivity which is larger than that of the corrosion-resistant ceramic of the plate-like body.

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What does patent US9287156B2 cover?
The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11 , a top surface 11 a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to th…
Who is the assignee on this patent?
Sumitomo Osaka Cement Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).