Lithographic apparatus involving an immersion liquid supply system with an aperture

Patent metadata

Field	Value
Publication number	US-9285686-B2
Application number	US-201414586468-A
Country	US
Kind code	B2
Filing date	Dec 30, 2014
Priority date	Jul 31, 2003
Publication date	Mar 15, 2016
Grant date	Mar 15, 2016

Abstract

In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

First claim

The invention claimed is:

1. A lithographic projection apparatus, comprising:
a movable table;
a projection system arranged to project a beam of onto a substrate, the projection system comprising an optical element nearest the table;
a liquid supply system configured to provide a liquid to a space between the table and the optical element and to provide the liquid so as to contact a surface, nearest the table, of the optical element, the liquid supply system comprising:
a liquid confinement structure extending along at least a part of a boundary of the space between the table and the optical element surface, at least part of the liquid confinement structure positioned between the optical element surface and the table and having an open aperture, the aperture having a cross-sectional width smaller than that of the substrate and the table being movable with respect to the at least part of the liquid confinement structure,
an inlet to supply the liquid to the space above the aperture, the aperture allowing the beam of radiation and liquid from the inlet to pass to the substrate, and
an outlet in or on the liquid confinement structure, the outlet configured to remove liquid, supplied by the inlet, from the space;

a degasser unit configured to separate gas from the liquid; and
a filter configured to remove particles from the liquid.

2. The lithographic apparatus according to claim 1 , wherein the degasser unit is disposed upstream of the inlet.

3. The lithographic apparatus according to claim 1 , further comprising a resistivity sensor, the resistivity sensor configured to determine the electrical resistivity of the liquid being supplied to the liquid confinement structure.

4. The lithographic apparatus according to claim 3 , further comprising another resistivity sensor downstream of the resistivity sensor.

5. The lithographic apparatus according to claim 1 , wherein the liquid supply system further comprises a UV source to irradiate liquid in the liquid supply system prior to supply to the space.

6. The lithographic apparatus according to claim 5 , further comprising a cleaner supply system configured to supply a cleaning fluid to the liquid supply system to clean at least part of the liquid supply system.

7. The lithographic apparatus according to claim 6 , wherein the cleaner supply system is configured to supply a peroxide solution.

8. The lithographic apparatus according to claim 1 , wherein the degasser unit is configured to degas the liquid being supplied to the inlet of the liquid confinement structure.

9. The lithographic apparatus according to claim 1 , wherein the degasser unit comprises a membrane contactor.

10. A device manufacturing method, comprising:
projecting a patterned beam of radiation, using a projection system of a lithographic apparatus, through a liquid onto a radiation-sensitive substrate;
supplying the liquid from a liquid supply system to a space between a movable table and an optical element, nearest the table, of the projection system, the supplied liquid contacting a surface, nearest the table, of the optical element;
at least partly confining the liquid in the space using a liquid confinement structure of the liquid supply system, the liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, at least part of the liquid confinement structure positioned between the optical element surface and the table and the at least part of the liquid confinement structure having an aperture through which the patterned beam passes, wherein the aperture has a cross-sectional width smaller than that of the substrate and liquid is supplied to the space above the aperture and passes through the aperture to the substrate;
removing liquid, supplied by the inlet, from the space using an outlet of the liquid confinement structure;
displacing the table with respect to the at least part of the liquid confinement structure;
degassing the liquid using a degasser unit; and
removing particles from the liquid using a filter.

11. The method according to claim 10 , further comprising irradiating liquid in the liquid supply system with UV radiation prior to supply to the space.

12. The method according to claim 10 , further comprising supplying a cleaning solution to the liquid supply system to clean at least part of the liquid supply system.

13. The method according to claim 12 , further comprising determining the electrical resistivity of the liquid being supplied to the liquid confinement structure using a resistivity sensor.

14. A lithographic apparatus, comprising:
a movable table;
a projection system arranged to project a beam of radiation from a patterning device onto a substrate, the projection system comprising an optical element nearest the table;
a liquid supply system configured to provide a liquid to a space between the table and the optical element and to provide the liquid so as to contact a surface, nearest the table, of the optical element, the liquid supply system comprising:
a liquid confinement structure extending along at least a part of a boundary of the space between the table and the optical element surface, at least part of the liquid confinement structure positioned between the optical element surface and the table and having an open aperture, the aperture having a cross-sectional width smaller than that of the substrate and the table being movable with respect to the at least part of the liquid confinement structure,
an inlet to supply the liquid to the space above the aperture, the aperture allowing the beam of radiation and liquid from the inlet to pass to the substrate, and
an outlet in or on the liquid confinement structure, the outlet configured to remove liquid, supplied by the inlet, from the space;

a degasser unit configured to degas the liquid being supplied to the inlet of the liquid confinement structure;
a temperature sensor configured measure a temperature of the liquid; and
a heat exchanger configured to control the temperature of the liquid.

15. The lithographic apparatus according to claim 14 , wherein the liquid supply system further comprises a UV source to irradiate liquid in the liquid supply system prior to supply to the space.

16. The lithographic apparatus according to claim 14 , further comprising a resistivity sensor, the resistivity sensor configured to determine the electrical resistivity of the liquid being supplied to the liquid confinement structure.

17. The lithographic apparatus according to claim 16 , further comprising another resistivity sensor, downstream of the resistivity sensor, configured to determine resistivity of the liquid.

18. The lithographic apparatus according to claim 14 , further comprising a cleaner supply system configured to supply a cleaning fluid to the liquid supply system to clean at least part of the liquid supply system.

19. The lithographic apparatus according to claim 14 , further comprising a flow meter arranged in the flow path from a source of the liquid to the inlet.

20. The lithographic apparatus according to claim 19 , wherein the degasser unit comprises a membrane contactor.

Assignees

• Asml Netherlands Bv

Inventors

• Mertens Jeroen Johannes Sophia Maria
• Hoogendam Christiaan Alexander
• Jansen Hans
• Tinnemans Patricius Aloysius Jacobus
• Van Den Schoor Leon Joseph Marie
• Donders Sjoerd Nicolaas Lambertus
• Streefkerk Bob

Classifications

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title