Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Lithographic apparatus and device manufacturing method
US9285685B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9285685-B2 |
| Application number | US-201414261208-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 24, 2014 |
| Priority date | Oct 15, 2003 |
| Publication date | Mar 15, 2016 |
| Grant date | Mar 15, 2016 |
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Abstract
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In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
First claim
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What is claimed is: 1. A lithographic apparatus, comprising: a substrate table configured to hold a substrate; a projection system configured to project a beam of radiation to be incident on an incident surface of a target portion of the substrate; a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, wherein the beam in the space has an optical axis along which the beam is focused; and a controller configured to a…
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- G03F7/70341Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US9285685B2 cover?
- In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
- Who is the assignee on this patent?
- Asml Netherlands Bv, Zeiss Carl Smt Gmbh
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).