Catadioptric projection objective

US9279969B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9279969-B2
Application numberUS-201414510454-A
CountryUS
Kind codeB2
Filing dateOct 9, 2014
Priority dateAug 13, 2009
Publication dateMar 8, 2016
Grant dateMar 8, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Catadioptric projection objectives for microlithography include: a first partial objective for imaging an object field onto a first real intermediate image; a catadioptric partial objective having one concave mirror and a lens for imaging the first intermediate image onto a second real intermediate image; a third partial objective including an aperture stop and no more than four lenses between the aperture stop and an image field, the third partial objective for imaging the second intermediate image onto the image field; and a first folding mirror for deflecting the radiation from the object plane toward the concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane. The projection objective is an immersion projection objective. At least one surface of the lens in the catadioptric partial objective has an antireflection coating including at least six layers.

First claim

Opening claim text (preview).

What is claimed is: 1. A catadioptric projection objective for microlithography for imaging an object field in an object plane onto an image field in an image plane when the object field is illuminated with radiation, comprising: a first partial objective for imaging the object field onto a first real intermediate image; a second partial objective for imaging the first intermediate image onto a second real intermediate image, wherein the second partial objective is a catadioptric partial objective having exactly one concave mirror and having at least one lens; a third partial objective for imaging the second intermediate image onto the image field, the third partial objective comprising an aperture stop and no more than four lenses between the aperture stop and the image plane; and a first folding mirror for deflecting the radiation from the object plane toward the concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane; wherein the catadioptric projection objective is an immersion projection objective in which during operation an immersion liquid is situated between a last lens surface and the image plane, and at least one surface of the at least one lens in the second partial objective has an antireflection coating comprising at least six layers. 2. The catadioptric projection objective of claim 1 , wherein there are four lenses between the aperture stop and the image plane. 3. The catadioptric projection objective of claim 1 , wherein there are three lenses between the aperture stop and the image plane. 4. The catadioptric projection objective of claim 1 , wherein the third partial objective comprises at least two negative lenses. 5. The catadioptric projection objective of claim 4 , wherein the at least two negative lenses are positioned between the second intermediate image and the aperture stop. 6. The catadioptric projection objective of claim 5 , wherein the third partial objective comprises at least one positive lens between the second intermediate image and the at least two negative lenses. 7. The catadioptric projection objective of claim 4 , wherein the third partial objective comprises three negative lenses. 8. The catadioptric projection objective of claim 4 , wherein the at least two negative lenses are adjacent lenses. 9. The catadioptric projection objective of claim 4 , wherein the at least two negative lenses have concave surfaces facing the image plane. 10. The catadioptric projection objective of claim 1 , wherein the projection objective has an image-side numerical aperture of at least 1.2 when the immersion liquid is situated between a last lens surface and the object plane. 11. The catadioptric projection objective of claim 1 , wherein the six layers of the antireflection coating are composed of layers having differing refractive indices of their adjacent layers at an operation wavelength of the catadioptric projection objective. 12. The catadioptric projection objective of claim 1 , wherein the antireflection coating comprising at least six layers is different from any coating on any lens in the first partial objective. 13. The catadioptric projection objective of claim 1 , wherein the antireflection coating comprising at least six layers is different from any coating on any lens in the third partial objective. 14. The catadioptric projection objective of claim 1 , wherein each lens surface in the second partial objective has an antireflection coating. 15. The catadioptric projection objective of claim 1 , wherein the antireflection coating has a reflectivity of less than 0.1% at an operation wavelength of the catadioptric projection objective for an angle-of-incidence range of between 0° and 20°. 16. The catadioptric projection objective of claim 1 , wherein the antireflection coating has a reflectivity of less than 0.2% at an operation wavelength of the catadioptric projection objective for an angle-of-incidence range of between 0° and 30°. 17. The catadioptric projection objective of claim 1 , wherein the first and third partial objectives share a common straight optical axis. 18. The catadioptric projection objective of claim 1 , wherein the concave mirror is arranged in the region of a pupil plane. 19. The catadioptric projection objective of claim 1 , wherein a deviation from a marginal ray concentricity at a surface of the at least one lens in the second partial objective is less than 20°.

Assignees

Inventors

Classifications

  • in projection exposure systems, e.g. microlithographic systems · CPC title

  • characterised by the lens design · CPC title

  • Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

  • Optical aspects of refractive lens systems, i.e. comprising only refractive elements · CPC title

  • Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements · CPC title

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What does patent US9279969B2 cover?
Catadioptric projection objectives for microlithography include: a first partial objective for imaging an object field onto a first real intermediate image; a catadioptric partial objective having one concave mirror and a lens for imaging the first intermediate image onto a second real intermediate image; a third partial objective including an aperture stop and no more than four lenses between …
Who is the assignee on this patent?
Zeiss Carl Smt Gmbh
What technology area does this patent fall under?
Primary CPC classification G02B17/08. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).