Arrangement for and method of characterising the polarization properties of an optical system

Patent metadata

Field	Value
Publication number	US-9274440-B2
Application number	US-201213560916-A
Country	US
Kind code	B2
Filing date	Jul 27, 2012
Priority date	Jan 28, 2010
Publication date	Mar 1, 2016
Grant date	Mar 1, 2016

Abstract

An arrangement for and a method of characterizing the polarization properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarization state generator ( 130, 230, 330 ) which sets a defined polarization state of radiation incident on the optical system, and a polarization state detector ( 140, 240, 340 ) adapted to measure the exit polarization state of radiation issuing from the optical system, wherein the optical system is designed for a working wavelength of less than 15 nm, and wherein the polarization state generator and/or the polarization state detector are so designed that their polarization-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°.

First claim

The invention claimed is:

1. An arrangement for characterising the polarisation properties of an optical system, comprising:
at least one polarisation state generator which sets a defined polarisation state of radiation incident on the optical system; and
a polarisation state detector adapted to measure the exit polarisation state of radiation issuing from the optical system;
wherein the optical system is designed for a working wavelength of less than 15 nm;
wherein at least one of the polarisation state generator and/or the polarisation state detector is so designed that its polarisation-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°, wherein the angle spectrum comprises a spectrum of angles between diverging beam portions of the incident beam;
wherein the at least one of the polarisation state generator and/or the polarisation state detector has at least one of a rotatable polariser and/or a rotatable retarder;
wherein the at least one of the rotatable polariser and/or the rotatable retarder has at least one multi-layer system having a plurality of individual layers; and
wherein the multi-layer system has a light entrance surface which is curved at least in regions along the surface such that an angle of incidence of the light beam on the surface is substantially constant for the angle spectrum of the light beam of at least 10°.

2. The arrangement as claimed in claim 1 , wherein the at least one of the polarisation state generator and/or the polarisation state detector is so designed that its polarisation-optical action on an incident light beam is substantially constant over substantially 100% of an entire angle spectrum of the light beam.

3. The arrangement as claimed in claim 1 , wherein the at least one of the polarisation state generator and/or the polarisation state detector has at least one optical element operated in transmission mode.

4. The arrangement as claimed in claim 1 , wherein the polarisation state detector is adapted for pupil-resolved measurement of the exit polarisation state.

5. The arrangement as claimed in claim 1 , wherein the plurality of individual layers is applied to a substrate which is curved at least in regions along the surface.

6. The arrangement as claimed in claim 1 , wherein the plurality of individual layers is arranged either free-standing or substrate-less or is arranged on a substrate of a thickness of a maximum of 400 nm.

7. The arrangement as claimed in claim 1 , wherein the rotatable polariser produces a linear exit polarisation degree of radiation issuing from the rotatable polariser of at least 95%.

8. The arrangement as claimed in claim 1 , wherein the rotatable retarder produces a retardation for radiation passing through the rotatable retarder of lambda/4+40%, wherein lambda is the working wavelength of the optical system.

9. The arrangement as claimed in claim 1 , further comprising a light source adapted to output a spectrum of wavelengths of light including the light beam and a wavelength filter adapted to filter a predetermined wavelength band out of the wavelength spectrum.

10. An apparatus for extreme-ultraviolet (EUV) lithography comprising
a projection objective adapted to operate in the EUV; and
an arrangement for characterising the polarisation properties of the projection objective;
wherein the arrangement comprises the generator and the detector as claimed in claim 1 ; and
wherein the optical system comprises the projection objective.

11. An arrangement for characterising the polarisation properties of an optical system, comprising:
at least one polarisation state generator which sets a defined polarisation state of radiation incident on the optical system; and
a polarisation state detector adapted to measure the exit polarisation state of radiation issuing from the optical system;
wherein the optical system is designed for a working wavelength of less than 15 nm;
wherein at least one of the polarisation state generator and/or the polarisation state detector are so designed that its polarisation-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°, wherein the angle spectrum comprises a spectrum of angles between diverging beam portions of the incident beam;
wherein the at least one of the polarisation state generator and/or the polarisation state detector has at least one of a rotatable polariser and/or a rotatable retarder; and
wherein the at least one of the rotatable polariser and/or the rotatable retarder has a plurality of substrates which are each provided with a respective multi-layer system.

12. The arrangement as claimed in claim 11 , wherein at least two of the substrates are arranged tilted relative to each other.

13. The arrangement as claimed in claim 11 , wherein at least one of the polarisation state generator and/or the polarisation state detector comprises the rotatable polariser and wherein the rotatable polariser produces a linear exit polarisation degree of radiation issuing from the rotatable polariser of at least 95%.

14. The arrangement as claimed in claim 11 , wherein at least one of the polarisation state generator and/or the polarisation state detector comprises the rotatable retarder and wherein the rotatable retarder produces a retardation for radiation passing through the retarder of lambda/4+40%, wherein lambda is the working wavelength of the optical system.

15. The arrangement as claimed in claim 11 , further comprising a light source outputting a spectrum of wavelengths of light including the light beam and a wavelength filter adapted to filter a predetermined wavelength band out of the wavelength spectrum.

16. The arrangement as claimed in claim 11 , wherein the optical system is designed for a numerical aperture of at least 0.7.

17. The arrangement as claimed in claim 11 , wherein the optical system outputs radiation over a given angle spectrum and the polarisation state detector is adapted to simultaneously measure the exit polarisation state of radiation issuing from the optical system over at least 50% of the angle spectrum of the radiation.

18. The arrangement as claimed in claim 11 , wherein the optical system has at least one mirror.

19. An apparatus for extreme-ultraviolet (EUV) lithography comprising
a projection objective adapted to operate in the EUV; and
an arrangement for characterising the polarisation properties of the projection objective;
wherein the arrangement comprises the generator and the detector as claimed in claim 11 ; and
wherein the optical system comprises the projection objective.

20. A method of characterising the polarisation properties of an optical system, wherein the method comprises:
setting a defined polarisation state of radiation incident on the optical system with a polarisation state generator; and
measuring in pupil-resolved relationship an exit polarisation state of radiation issuing from the optical system with a polarisation state detector;
wherein the optical system is designed for a working wavelength of less than 15 nm; and
wherein at least one of the polarisation state generator and/or the polarisation state detector has at least one optical element operated in transmission mode;
wherein a light entrance surface of at least one of the polarisation state generator and/or the polarisation state detector is curved at least in regions along the surface such that an angle of incidence of a light beam on the

Assignees

• Hempelmann Uwe
• Mengel Markus
• Huber Peter
• Zeiss Carl Smt Gmbh

Inventors

• Hempelmann Uwe
• Mengel Markus
• Huber Peter

Classifications

• G03F7/70566

  Polarisation control · CPC title

• G03F7/7085 Primary

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G02B5/30 Primary

  Polarising elements (light-modulating devices with active elements G02F1/00) · CPC title