Analysis method and analysis unit for determining radiological result data
US-11918398-B2 · Mar 5, 2024 · US
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Huber Peter patents
Huber Peter is listed as an inventor on 29 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Huber Peter |
| Total patents | 29 |
| First publication | Jan 29, 2015 |
| Latest publication | Mar 5, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Mirror, in particular for a microlithographic projection exposure apparatus or an inspection system
US-11086055-B2 · Aug 10, 2021 · US
Wavefront correction element for use in an optical system
US-10684553-B2 · Jun 16, 2020 · US
Wavefront correction element for use in an optical system
US-2020033735-A1 · Jan 30, 2020 · US
Mirror, in particular for a microlithographic projection exposure apparatus or an inspection system
US-2019339428-A1 · Nov 7, 2019 · US
Analysis method and analysis unit for determining radiological result data
US-2019298288-A1 · Oct 3, 2019 · US
Method for producing a mirror element
US-10423073-B2 · Sep 24, 2019 · US
Laminating body
US-10399318-B2 · Sep 3, 2019 · US
Reflective optical element
US-10338476-B2 · Jul 2, 2019 · US
Mask for EUV lithography, EUV lithography apparatus and method for determining a contrast proportion caused by DUV radiation
US-10156782-B2 · Dec 18, 2018 · US
Recent patents
Latest publications not already listed above.
Reflective optical element
US-2018307142-A1 · Oct 25, 2018 · US
Reflective optical element and optical system for EUV lithography
US-9996005-B2 · Jun 12, 2018 · US
Control object for controlling a transfer of dual-energy ct image data to a client device
US-2017357754-A1 · Dec 14, 2017 · US
Mirror, in particular for a microlithographic projection exposure apparatus
US-9810993-B2 · Nov 7, 2017 · US
Mask for EUV Lithography, EUV Lithography Apparatus and Method for Determining a Contrast Proportion Caused by DUV Radiation
US-2017219920-A1 · Aug 3, 2017 · US
Mirror for the EUV wavelength range, method for producing such a mirror, and projection exposure apparatus comprising such a mirror
US-9696632-B2 · Jul 4, 2017 · US
Laminating body
US-9604441-B2 · Mar 28, 2017 · US
Dishwashing Device for an Aircraft
US-2017049293-A1 · Feb 23, 2017 · US
Method for producing a mirror element
US-2016342093-A1 · Nov 24, 2016 · US
Computer system and method for image processing
US-9454547-B2 · Sep 27, 2016 · US
Mirror, in particular for a microlithographic projection exposure apparatus
US-2016246179-A1 · Aug 25, 2016 · US
Laminating body
US-2016243807-A1 · Aug 25, 2016 · US
Memory device and method for putting a memory cell into a state with a reduced leakage current consumption
US-9412422-B2 · Aug 9, 2016 · US
Arrangement for and method of characterising the polarization properties of an optical system
US-9274440-B2 · Mar 1, 2016 · US
Computer system and method for image processing
US-2015146948-A1 · May 28, 2015 · US
Security elements for antennas
US-9027839-B2 · May 12, 2015 · US
Mirror for the EUV Wavelength Range, Method for Producing such a Mirror, and Projection Exposure Apparatus Comprising such a Mirror
US-2015055108-A1 · Feb 26, 2015 · US
Optical Elements Comprising Magnetostrictive Material
US-2015043060-A1 · Feb 12, 2015 · US
Memory device and method for putting a memory cell into a state with a reduced leakage current consumption
US-2015029807-A1 · Jan 29, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 17 |
| Giesecke & Devrient Gmbh | 4 |
| Siemens Healthcare Gmbh | 3 |
| Huber Peter | 3 |
| Infineon Technologies Ag | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G21K1/062 | 10 |
| G02B5/0891 | 10 |
| G03F7/70316 | 9 |
| G03F7/702 | 8 |
| G03F7/70958 | 8 |