Method for manufacturing a substrate coated with mesoporous antistatic film, and use thereof in ophthalmic optics

US9266772B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9266772-B2
Application numberUS-201013390316-A
CountryUS
Kind codeB2
Filing dateAug 12, 2010
Priority dateAug 13, 2009
Publication dateFeb 23, 2016
Grant dateFeb 23, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention relates to an article comprising a substrate having a main surface coated with a mesoporous antistatic coating, said coating having a refractive index lower than or equal to 1.5, and a silica based matrix functionalized by ammonium groups, said matrix having a hydrophobic character. Under certain conditions, the mesoporous antistatic coating is a single-layer anti-reflection coating or is part of a multi-layer anti-reflection coating. This invention further relates to a method for manufacturing said article, and to the use of a mesoporous coating having a silica based matrix functionalized by ammonium groups, as an antistatic coating.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing a substrate coated with a mesoporous antistatic film, comprising: a) preparing a precursor sol of a mesoporous antistatic film comprising: at least one inorganic precursor agent A selected from compounds of formula: Si(X) 4  wherein the X groups independently are hydrolyzable groups or a hydrolyzate of such precursor agent; at least one precursor agent B selected from organosilanes comprising: a silicon atom carrying at least two hydrolyzable groups; and at least one ammonium group; or a hydrolyzate of such precursor agent; at least one organic solvent, at least one pore-forming agent, and water; the B compound / A compound molar ratio ranging from 0.1 to 0.8; b) depositing the precursor sol to form a precursor sol film onto a main surface of the substrate; c) consolidating the deposited film; d) removing the pore-forming agent from the film resulting from the previous step; and e) recovering a mesoporous antistatic film having a refractive index lower than or equal to 1.45; the method further comprising: (i) a step of treating the film after step b) or after step c), with at least one hydrophobic reactive compound carrying at least one hydrophobic group; and/or (ii) a step of introducing at least one hydrophobic precursor agent carrying at least one hydrophobic group into the precursor sol before the step b) of depositing the precursor sol film. 2. The method of claim 1 , wherein at least one X group is an alkoxy, acyloxy or halogen group. 3. The method of claim 1 , wherein the precursor sol of a mesoporous antistatic film further comprises a hydrolysis catalyst for the X groups. 4. The method of claim 1 , wherein the precursor agent B is a compound, or a hydrolyzate thereof, of formula: R n Y m Si(X′) 4-n-m   (II) wherein the Y groups independently are monovalent organic groups bound to silicon through a carbon atom and comprise at least one ammonium group, the X′ groups independently are hydrolyzable groups, R is a monovalent organic group bound to silicon through a carbon atom, n and m being integers such that m =1 or 2 with n+m =1 or 2. 5. The method of claim 4 , wherein the ammonium group is located at the terminal position of the Y group. 6. The method of claim 4 , wherein the Y group is a group of formula: wherein z is an integer, R 1 , R 2 and R 3 independently represent hydrogen atoms, aryl groups, aralkyl groups or linear or branched alkyl groups, and W is an anion. 7. The method of claim 6 , wherein z ranges from 2 to 20. 8. The method of claim 6 , wherein R 1 , R 2 and R 3 independently represent alkyl groups having from 1 to 20 carbon atoms. 9. The method of claim 1 , wherein the pore-forming agent is a polyethylene glycol alkyl monoether of formula: H(OCH 2 CH 2 ) n OR 1   (IV) wherein R l is a linear or branched alkyl group and n is an integer from 1 to 200. 10. The method of claim 1 , wherein the precursor sol does not contain any hydrophobic precursor agent carrying at least one hydrophobic group. 11. The method of claim 1 , wherein the hydrophobic reactive compound is selected from compounds and mixtures of compounds of formula: (R′ 1′ ) 3 (R′ 2 )Si   (V) wherein: the R′ 1 groups independently represent saturated or unsaturated, hydrophobic hydrocarbon groups; and R′ 2 represents a hydrolyzable group. 12. The method of claim 1 , wherein the substrate is a substrate for an optical lens or an optical lens blank. 13. The method of claim 1 , wherein the mesoporous coating has a thickness ranging from 50 nm to 1 μm. 14. The method of claim 13 , wherein the hydrophobic reactive compound is a fluoroalkyl chlorosilane, fluoroalkyl dialkyl chlorosilane, alkylalkoxysilane, fluoroalkyl alkoxysilane, fluoroalkyl dialkyl alkoxysilane, alkylchlorosilane, trialkylsilazane, or hexaalkyldisilazane. 15. The method of claim 13 , wherein the mesoporous coating has a thickness ranging from 50 to 150 nm.

Assignees

Inventors

Classifications

  • C01B33/145Primary

    Preparation of hydroorganosols, organosols or dispersions in an organic medium · CPC title

  • Crystalline silica-polymorphs, e.g. silicalites {dealuminated aluminosilicate zeolites} · CPC title

  • Coating · CPC title

  • Of silicon-containing material [e.g., glass, etc.] · CPC title

  • Anti-static materials · CPC title

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What does patent US9266772B2 cover?
The present invention relates to an article comprising a substrate having a main surface coated with a mesoporous antistatic coating, said coating having a refractive index lower than or equal to 1.5, and a silica based matrix functionalized by ammonium groups, said matrix having a hydrophobic character. Under certain conditions, the mesoporous antistatic coating is a single-layer anti-reflecti…
Who is the assignee on this patent?
Cadet Mamonjy, Feuillade Mathieu, Essilor Int
What technology area does this patent fall under?
Primary CPC classification C01B33/145. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).