Thermal interface material with support structure

US9263364B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9263364-B2
Application numberUS-201113215416-A
CountryUS
Kind codeB2
Filing dateAug 23, 2011
Priority dateMar 18, 2009
Publication dateFeb 16, 2016
Grant dateFeb 16, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Various semiconductor chip thermal interface material methods and apparatus are disclosed. In one aspect, a method of establishing thermal contact between a first semiconductor chip and a heat spreader is provided. The method includes placing a thermal interface material layer containing a support structure on the first semiconductor chip. The heat spreader is positioned proximate the thermal interface material layer. The thermal interface material layer is reflowed to establish thermal contact with both the first semiconductor chip and the heat spreader.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus, comprising: a first semiconductor chip having a first footprint; a second semiconductor chip mounted on the first semiconductor chip and having a second footprint smaller than the first footprint and a side facing away from the first semiconductor chip; and a thermal interface material layer on the side of the second semiconductor chip, the thermal interface material layer containing a support structure having a third footprint larger than the second footprint. 2. The apparatus of claim 1 , wherein the thermal interface material layer has a first thickness and the support structure has a second thickness less than the first thickness. 3. The apparatus of claim 1 , wherein the thermal interface material layer comprises solder. 4. The apparatus of claim 3 , wherein the solder comprises indium. 5. The apparatus of claim 1 , wherein the support structure comprises a mesh. 6. The apparatus of claim 5 , wherein the mesh comprises a wire mesh. 7. The apparatus of claim 1 , wherein the support structure comprises a plurality of pillars. 8. The apparatus of claim 1 , wherein the first semiconductor chip comprises silicon and plural through-silicon vias. 9. An apparatus, comprising: a substrate; a first semiconductor chip mounted to the substrate and having a first footprint; a second semiconductor chip mounted on the first semiconductor chip and having a second footprint smaller than the first footprint and a side facing away from the first semiconductor chip; and a thermal interface material layer on the side of the second semiconductor chip, the thermal interface material layer containing a support structure having a third footprint larger than the second footprint. 10. The apparatus of claim 9 , wherein the thermal interface material layer has a first thickness and the support structure has a second thickness less than the first thickness. 11. The apparatus of claim 9 , comprising a heat spreader in thermal contact with the thermal interface material layer. 12. The apparatus of claim 11 , wherein the heat spreader comprises a semiconductor chip package lid. 13. The apparatus of claim 9 , wherein the substrate comprises a circuit board. 14. The apparatus of claim 13 , wherein the circuit board comprises a semiconductor chip package substrate. 15. The apparatus of claim 9 , wherein the support structure comprises a mesh. 16. The apparatus of claim 15 , wherein the mesh comprises a wire mesh. 17. The apparatus of claim 9 , wherein the support structure comprises a plurality of pillars. 18. The apparatus of claim 9 , wherein the first semiconductor chip comprises silicon and plural through-silicon vias electrically connecting the second semiconductor chip to the substrate. 19. The apparatus of claim 9 , wherein the thermal interface material layer comprises solder. 20. The apparatus of claim 19 , wherein the solder comprises indium.

Assignees

Inventors

Classifications

  • between a chip and a stacked lead frame, conducting package substrate or heat sink · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • on active surfaces of flip-chip devices, e.g. underfills · CPC title

  • changes in dispositions · CPC title

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What does patent US9263364B2 cover?
Various semiconductor chip thermal interface material methods and apparatus are disclosed. In one aspect, a method of establishing thermal contact between a first semiconductor chip and a heat spreader is provided. The method includes placing a thermal interface material layer containing a support structure on the first semiconductor chip. The heat spreader is positioned proximate the thermal i…
Who is the assignee on this patent?
Touzelbaev Maxat, Refai-Ahmed Gamal, Yang Yizhang, and 3 more
What technology area does this patent fall under?
Primary CPC classification H10W40/70. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).