Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply
US9256136B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9256136-B2 |
| Application number | US-201113090311-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 20, 2011 |
| Priority date | Apr 22, 2010 |
| Publication date | Feb 9, 2016 |
| Grant date | Feb 9, 2016 |
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Abstract
Official abstract text for this publication.
A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
First claim
Opening claim text (preview).
The invention claimed is: 1. A fluid handling structure for a lithographic apparatus, the fluid handling structure configured to confine immersion liquid to a space, the fluid handling structure comprising: an elongate opening or a plurality of openings arranged in a first line that, in use, is directed towards a facing surface of a substrate, of a substrate table configured to support the substrate, or of both the substrate and substrate table, the elongate opening or plurality o…
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Classifications
- G03F7/70341Primary
Physics · mapped topic
Physics · mapped topic
- H10P76/2041Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9256136B2 cover?
- A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to sup…
- Who is the assignee on this patent?
- Cortie Rogier Hendrikus Magdalena, Liebregts Paulus Martinus Maria, Riepen Michel, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 09 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).