Method for manufacturing liquid crystal device

US9249496B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9249496-B2
Application numberUS-43411109-A
CountryUS
Kind codeB2
Filing dateMay 1, 2009
Priority dateMay 15, 2008
Publication dateFeb 2, 2016
Grant dateFeb 2, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method for manufacturing a liquid crystal device that includes forming an inorganic alignment layer by emitting an alignment film material that is made of an inorganic material in an oblique direction onto a substrate, and forming an organic alignment layer that is a monomolecular film made of an organic material chemically bonded with the inorganic alignment layer on a surface of the inorganic alignment layer by treating the surface of the inorganic alignment layer with a silane coupling agent that has an alkyl group, wherein a pretilt angle of a liquid crystal molecule is set to a desired angle by selecting the silane coupling agent by the number of carbon atoms.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a liquid crystal device that has a liquid crystal layer interposed between a pair of substrates which oppose each other and an alignment film which is formed on an inner face side of at least one of the substrates, comprising: forming an inorganic alignment layer that has a plurality of columnar structures in which crystals grow in an oblique direction with respect to a normal line of the substrate by using sputtering equipment in which a pair of targets made of silicon oppose each other with a plasma forming region interposed therebetween, by emitting an alignment film material that is made of either an SiO or an SiO 2 material in an oblique direction onto the substrate from the targets; and forming an organic alignment layer on a surface of the inorganic alignment layer by treating the surface of the inorganic alignment layer with a silane coupling agent having an alkyl group such that an Si atom of the silane coupling agent is directly bonded to oxygen of the SiO or SiO 2 material and the Si atom of the silane coupling agent bonds the alkyl group to the SiO or SiO 2 material, wherein the alkyl group is an alkyl chain consisting essentially of 6 to 18 carbon atoms, a pretilt angle of a liquid crystal molecule is set to a desired angle by selecting the silane coupling agent by the number of carbon atoms; and the organic alignment layer is a monomolecular film. 2. The method for manufacturing a liquid crystal device according to claim 1 , wherein the sputtering equipment emits the alignment film material at an emission angle of less than 60° with respect to the normal line direction of the substrate. 3. The method for manufacturing a liquid crystal device according to claim 2 , wherein the emission angle with respect to the normal line direction is 45° or less. 4. The method for manufacturing a liquid crystal device according to claim 1 , wherein the silane coupling agent with the number of the carbon atoms of 8 to 10 both inclusive is used. 5. The method for manufacturing a liquid crystal device according to claim 1 , wherein the silane coupling agent with the number of the carbon atoms of 10 or more but less than 18 is used. 6. The method for manufacturing a liquid crystal device according to claim 1 , wherein the pretilt angle is set to 3° or more from the normal line direction.

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What does patent US9249496B2 cover?
A method for manufacturing a liquid crystal device that includes forming an inorganic alignment layer by emitting an alignment film material that is made of an inorganic material in an oblique direction onto a substrate, and forming an organic alignment layer that is a monomolecular film made of an organic material chemically bonded with the inorganic alignment layer on a surface of the inorgan…
Who is the assignee on this patent?
Zhang Huiping, Nakata Hideo, Seki Shinsuke, and 2 more
What technology area does this patent fall under?
Primary CPC classification C23C14/226. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).