Chamber apparatus and heating method

Patent metadata

Field	Value
Publication number	US-9236283-B2
Application number	US-201313795764-A
Country	US
Kind code	B2
Filing date	Mar 12, 2013
Priority date	Mar 12, 2013
Publication date	Jan 12, 2016
Grant date	Jan 12, 2016

Abstract

A chamber apparatus including a chamber which accommodates a substrate having a coating film formed thereon; a first heating part which is accommodated in the chamber and disposed on a first face side of the substrate; a second heating part which is accommodated in the chamber and disposed on a second face side of the substrate opposite to the first face; and a pressure control part which is capable of pressurizing and depressurizing inside of the chamber in a heated state.

First claim

What is claimed is:

1. A chamber apparatus comprising:
a chamber which accommodates a substrate having a coating film formed thereon, the chamber comprising a substrate loading opening where the substrate is loaded;
a first heating part which is accommodated in the chamber and disposed on a first face side of the substrate;
a second heating part which is accommodated in the chamber and disposed on a second face side of the substrate opposite to the first face;
a pressure control part which is capable of pressurizing and depressurizing inside of the chamber in a heated state; and
gas flow part which allows a temperature control gas to flow between the first heating part and the second heating part,
the gas flow part comprising:
a gas ejection opening which is directed from outside of the substrate loading opening to inside of the chamber,
a suction opening which is provided at a position which sandwiches the first heating part and the second heating part with the gas ejection opening in a flowing direction of the temperature control gas, and
a circulation path which returns the temperature control gas suctioned from the suction opening to the gas ejection opening.

2. The chamber apparatus according to claim 1 , wherein the chamber comprises a gas supply part which supplies a reaction promoter gas to the ambient atmosphere of the coating film.

3. The chamber apparatus according to claim 1 , wherein the gas ejection opening is configured to be capable of being lifted up and down.

4. The chamber apparatus according to claim 1 , wherein the circulation path comprises a filter which removes foreign matters contained in the temperature control gas.

5. The chamber apparatus according to claim 1 , wherein the chamber comprises a first section and a second section which are dividable in one direction.

6. The chamber apparatus according to claim 5 , wherein one of the first heating part and the second heating part is provided in the first section, and the other is provided in the second section.

7. The chamber apparatus according to claim 5 , wherein the first section and the second section are relatively movable in a direction intersecting with a dividing direction.

8. The chamber apparatus according to claim 7 , wherein one of the first section and the second section is configured to be drawable in one direction.

9. The chamber apparatus according to claim 5 , wherein the chamber comprises a volume changing part formed in a ring which is inserted between the first section and the second section so as to change the volume of the inside of the chamber.

10. The chamber apparatus according to claim 9 , wherein the chamber comprises a connecting part which is provided on one of the first section and the second section and connects the volume changing part.

11. The chamber apparatus according to claim 1 , wherein the chamber comprises an inner wall face which surrounds the substrate, and at least a part of the inner wall face is provided with a curved portion which is curved toward outside of the chamber.

12. The chamber apparatus according to claim 11 , wherein a heat insulation part is provided at at least one of a position between the inner wall face and the first heating part and a position between the inner wall face and the second heating part.

13. The chamber apparatus according to claim 1 , wherein the first heating part and the second heating part each independently comprises an outer periphery heating part which heats a ring-shaped outer peripheral region along an outer periphery of the substrate, and an inner periphery heating part which heats a ring-shaped inner peripheral region provided within the ring-shaped outer peripheral region.

14. A method of heating, comprising:
accommodating a substrate having a coating film formed thereon in a chamber by loading the substrate from a substrate loading opening;
heating the substrate accommodated in the chamber using a first heating part disposed on a first face side of the substrate and a second heating part disposed on a second face side of the substrate opposite to the first face;
switching pressurizing and depressurizing inside of the chamber depending on a heating state of the substrate;
allowing a temperature control gas to flow between the first heating part and the second heating part, the temperature control gas being introduced from a gas ejection opening which is directed from outside of the substrate loading opening to inside of the chamber;
suctioning the temperature control gas from a suction opening which is provided at a position which sandwiches the first heating part and the second heating part with the gas ejection opening in a flowing direction of the temperature control gas; and
returning the temperature control gas suctioned from the suction opening to the gas ejection opening.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Sahoda Tsutomu
• Masu Yoshiaki
• Maruyama Takashi

Classifications

• H10P72/3314

  Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers · CPC title

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0456

  in-line arrangement · CPC title

• H10P72/0441

  Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

• H10P72/0434 Primary

  mainly by convection · CPC title