Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-9236226-B2
Application number	US-201213428512-A
Country	US
Kind code	B2
Filing date	Mar 23, 2012
Priority date	Mar 25, 2011
Publication date	Jan 12, 2016
Grant date	Jan 12, 2016

Abstract

In the plasma processing apparatus 10 , a processing space S is formed between a susceptor 12 and an upper electrode 13 facing the susceptor 12 . The plasma processing apparatus 10 includes a magnetic field generating unit provided at a side of the upper electrode 13 opposite to the processing space S. The magnetic field generating unit includes a magnetic force line generating unit 27 having a pair of annular magnet rows 27 a and 27 b . The annular magnet rows 27 a and 27 b are provided at the side of the upper electrode 13 opposite to the processing space S and arranged concentrically when viewed from the top. In the magnetic force line generating unit 27 , an angle θ1 formed by axial lines of magnets of the annular magnet rows 27 a and 27 b is set to be in a range of about 0°<θ1≦180°.

First claim

What is claimed is:

1. A plasma processing apparatus, having a lower electrode and an upper electrode positioned at a top of a chamber and facing the lower electrode, for performing a plasma process on a substrate mounted on the lower electrode by generating plasma in a processing space between the lower electrode and the upper electrode, the plasma processing apparatus comprising:
a magnetic field generating unit provided at an upper side of the upper electrode opposite to a lower side facing the processing space,
wherein the magnetic field generating unit includes at least three magnetic force line generating units arranged in at least three corresponding concentric circles, each of the at least three magnetic force line generating units having a pair of annular magnet rows arranged at the upper side of the upper electrode, each magnet defining an axial line,
wherein the pair of annular magnet rows is arranged such that an angle θ1 between the axial lines is set to be an acute angle such that a vertical component of a magnetic field generated in the processing space by the magnetic field generating unit is smaller than a horizontal component thereof, and
wherein the at least three magnetic force line generating units are configured to be movable individually or in a specific combination toward or away from the processing space.

2. The plasma processing apparatus of claim 1 ,
wherein one end portions of the pair of annular magnet rows opposite to the processing space are magnetically connected to each other, and
magnetic force lines reaching the processing space are generated between the other end portions of the pair of annular magnet rows facing the processing space.

3. The plasma processing apparatus of claim 2 , wherein the angle θ1 is set to be about 90°.

4. The plasma processing apparatus of claim 2 , wherein the angle θ1 is set to be about 180°.

5. The plasma processing apparatus of claim 1 ,
wherein the magnetic field generating unit includes at least one magnetic force line generating unit having a pair of annular magnet rows and two yokes, the pair of annular magnet rows being provided at the side of the upper electrode opposite to the side facing the processing space and arranged concentrically when viewed from the top, and the two yokes respectively being connected to one end portions of the pair of annular magnet rows facing the processing space,
the pair of annular magnet rows in the at least one magnetic force line generating unit is arranged such that an angle θ2 formed by axial lines of the two yokes is set to be in a range of about 0°<θ2≦180°,
the other end portions of the pair of annular magnet rows opposite to the one end portions facing the processing space are magnetically connected to each other, and
magnetic force lines reaching the processing space are generated between end portions of the two yokes connected to the one end portions of the pair of annular magnet rows facing the processing space.

6. The plasma processing apparatus of claim 5 , wherein the angle θ2 is set to be an acute angle.

7. The plasma processing apparatus of claim 5 , wherein the angle θ2 is set to be about 90°.

8. The plasma processing apparatus of claim 5 , wherein the angle θ2 is set to be about 180°.

9. The plasma processing apparatus of claim 1 ,
wherein a DC power supply or a high frequency power supply is connected between the upper electrode and the lower electrode.

10. The plasma processing apparatus of claim 2 ,
wherein one of the pair of annular magnet rows in the at least one magnetic force line generating unit is configured to be independently movable toward or away from the processing space.

11. The plasma processing apparatus of claim 5 ,
wherein the at least one magnetic force line generating unit is plural in number,
a protrusion is formed at a yoke connected to one of the pair of annular magnet rows in one magnetic force line generating unit and is protruded toward a yoke connected to one of the pair of annular magnet rows in adjacent other magnetic force line generating unit, and
a distance between the yokes in two adjacent magnetic force line generating units when the protrusion is formed is smaller than a distance between yokes when the protrusion is not formed.

12. The plasma processing apparatus of claim 2 ,
wherein the one end portions of the pair of annular magnet rows opposite to the processing space are magnetically connected to each other via an annular yoke when viewed from the top.

13. The plasma processing apparatus of claim 2 ,
wherein the one end portions of the pair of annular magnet rows opposite to the processing space are magnetically connected to each other with a gap therebetween.

14. The plasma processing apparatus of claim 2 ,
wherein the at least one magnetic force line generating unit includes a single magnet row and a yoke whose one end is connected to an end portion of the magnet row opposite to the processing space and the other end faces the processing space.

15. The plasma processing apparatus of claim 2 ,
wherein the at least one magnetic force line generating unit includes a permanent magnet row having a reverse U-shaped cross section that is opened toward the processing space.

Assignees

• Yamawaku Jun
• Kimura Takafumi
• Koshimizu Chishio
• Tokyo Electron Ltd

Inventors

• Yamawaku Jun
• Kimura Takafumi
• Koshimizu Chishio

Classifications

• H01J37/32091 Primary

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• H01J37/32669

  Particular magnets or magnet arrangements for controlling the discharge · CPC title