Array of carbon nanotube micro-tip structures
US-2016329184-A1 · Nov 10, 2016 · US
US9570268B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9570268-B2 |
| Application number | US-201414787263-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 14, 2014 |
| Priority date | Apr 25, 2013 |
| Publication date | Feb 14, 2017 |
| Grant date | Feb 14, 2017 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.
Opening claim text (preview).
The invention claimed is: 1. An electron gun comprising: a needle-like electron source acting as a field emission type electron source; an acceleration electrode to accelerate an electron emitted from the electron source; a control electrode disposed nearer to a side of the electron source than to a side of the acceleration electrode and having an aperture diameter larger than an aperture diameter of the acceleration electrode; and a control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode. 2. The electron gun according to claim 1 , wherein provided that the aperture diameter of the acceleration electrode is defined as D and a distance between the electron source and the acceleration electrode is defined as L, a fraction of D to L is expressed with D/L<1. 3. The electron gun according to claim 2 , wherein the distance between the electron source and the acceleration electrode is defined as 6 mm<L<20 mm. 4. The electron gun according to claim 1 , wherein the electron gun is of Cold (Cathode) Field Emission (CFE) type. 5. The electron gun according to claim 3 , wherein the electron gun is provided with two or more pieces of control electrodes. 6. The electron gun according to claim 3 , wherein a drawing electrode is provided between the acceleration electrode and the control electrode. 7. The electron gun according to claim 5 , wherein the electron gun is provided with a control mechanism to switch over electrodes in use according to an acceleration voltage of the electron. 8. A charged particle beam apparatus employing the electron gun according to claim 1 , the apparatus comprising at least one or more pieces of one of electrostatic and magnetic field lenses; a sample stage on which an observation sample is placed; and a detector to detect at least one of a reflected electron and a secondary electron, wherein the sample is observed or analyzed by the electron beam. 9. The charged particle beam apparatus according to claim 8 provided with an electron optical system employing one piece of one of electrostatic and magnetic field lenses. 10. The charged particle beam apparatus according to claim 8 , wherein an outer diameter size of one of the electron gun and an objective lens is 200 mm or smaller. 11. The charged particle beam apparatus according to claim 8 provided with a function to observe the sample employing the electron beam with a lower acceleration, in which the acceleration voltage of the electron ranges from 0.1 to 3 kV. 12. A charged particle gun comprising: a charged particle source; an acceleration electrode to accelerate a charged particle emitted from the charged particle source; a control electrode disposed nearer to a side of the charged particle source than to a side of the acceleration electrode and having a larger aperture diameter than an aperture diameter of the acceleration electrode; and a control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode. 13. A charged particle beam apparatus employing the charged particle gun according to claim 12 , the apparatus comprising: a sample stage on which an observation sample is placed; an objective lens to focus and irradiate the charged particle beam onto the sample; and a detector to detect a secondary electron, wherein the sample is observed or analyzed by the charged particle beam. 14. The charged particle beam apparatus according to claim 13 , wherein the charged particle drawn from the charged particle source are decelerated for use. 15. A charged particle gun comprising: a charged particle source; an acceleration electrode to accelerate a charged particle emitted from the charged particle source; a control electrode disposed nearer to a side of the charged particle source than to a side of the acceleration electrode; and a control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode, wherein the control section applies a control voltage to enhance an electric field at a tip end of the charged particle source to the control electrode when an acceleration voltage of the acceleration electrode is low whereas applying a control voltage to suppress the electric field at the tip end of the charged particle source to the control electrode when the acceleration voltage is high.
Ion sources; Ion guns {(for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00)} · CPC title
Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title
using surface ionisation, e.g. field effect ion sources, thermionic ion sources (H01J27/20, H01J27/24 take precedence) · CPC title
with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title
Electron sources; Electron guns · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.