Electron gun, charged particle gun, and charged particle beam apparatus using electron gun and charged particle gun

US9570268B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9570268-B2
Application numberUS-201414787263-A
CountryUS
Kind codeB2
Filing dateApr 14, 2014
Priority dateApr 25, 2013
Publication dateFeb 14, 2017
Grant dateFeb 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electron gun comprising: a needle-like electron source acting as a field emission type electron source; an acceleration electrode to accelerate an electron emitted from the electron source; a control electrode disposed nearer to a side of the electron source than to a side of the acceleration electrode and having an aperture diameter larger than an aperture diameter of the acceleration electrode; and a control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode. 2. The electron gun according to claim 1 , wherein provided that the aperture diameter of the acceleration electrode is defined as D and a distance between the electron source and the acceleration electrode is defined as L, a fraction of D to L is expressed with D/L<1. 3. The electron gun according to claim 2 , wherein the distance between the electron source and the acceleration electrode is defined as 6 mm<L<20 mm. 4. The electron gun according to claim 1 , wherein the electron gun is of Cold (Cathode) Field Emission (CFE) type. 5. The electron gun according to claim 3 , wherein the electron gun is provided with two or more pieces of control electrodes. 6. The electron gun according to claim 3 , wherein a drawing electrode is provided between the acceleration electrode and the control electrode. 7. The electron gun according to claim 5 , wherein the electron gun is provided with a control mechanism to switch over electrodes in use according to an acceleration voltage of the electron. 8. A charged particle beam apparatus employing the electron gun according to claim 1 , the apparatus comprising at least one or more pieces of one of electrostatic and magnetic field lenses; a sample stage on which an observation sample is placed; and a detector to detect at least one of a reflected electron and a secondary electron, wherein the sample is observed or analyzed by the electron beam. 9. The charged particle beam apparatus according to claim 8 provided with an electron optical system employing one piece of one of electrostatic and magnetic field lenses. 10. The charged particle beam apparatus according to claim 8 , wherein an outer diameter size of one of the electron gun and an objective lens is 200 mm or smaller. 11. The charged particle beam apparatus according to claim 8 provided with a function to observe the sample employing the electron beam with a lower acceleration, in which the acceleration voltage of the electron ranges from 0.1 to 3 kV. 12. A charged particle gun comprising: a charged particle source; an acceleration electrode to accelerate a charged particle emitted from the charged particle source; a control electrode disposed nearer to a side of the charged particle source than to a side of the acceleration electrode and having a larger aperture diameter than an aperture diameter of the acceleration electrode; and a control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode. 13. A charged particle beam apparatus employing the charged particle gun according to claim 12 , the apparatus comprising: a sample stage on which an observation sample is placed; an objective lens to focus and irradiate the charged particle beam onto the sample; and a detector to detect a secondary electron, wherein the sample is observed or analyzed by the charged particle beam. 14. The charged particle beam apparatus according to claim 13 , wherein the charged particle drawn from the charged particle source are decelerated for use. 15. A charged particle gun comprising: a charged particle source; an acceleration electrode to accelerate a charged particle emitted from the charged particle source; a control electrode disposed nearer to a side of the charged particle source than to a side of the acceleration electrode; and a control section to control a potential applied to the control electrode based on a potential applied to the acceleration electrode, wherein the control section applies a control voltage to enhance an electric field at a tip end of the charged particle source to the control electrode when an acceleration voltage of the acceleration electrode is low whereas applying a control voltage to suppress the electric field at the tip end of the charged particle source to the control electrode when the acceleration voltage is high.

Assignees

Inventors

Classifications

  • Ion sources; Ion guns {(for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00)} · CPC title

  • Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

  • using surface ionisation, e.g. field effect ion sources, thermionic ion sources (H01J27/20, H01J27/24 take precedence) · CPC title

  • with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

  • Electron sources; Electron guns · CPC title

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What does patent US9570268B2 cover?
The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates cha…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/073. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).