Apparatus for storing substrates

US9184075B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9184075-B2
Application numberUS-201414185041-A
CountryUS
Kind codeB2
Filing dateFeb 20, 2014
Priority dateFeb 20, 2013
Publication dateNov 10, 2015
Grant dateNov 10, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus for storing a substrate on which a pattern is formed includes a main body storing the substrate, a first pad located at the bottom of the main body and including a first groove supporting one edge of the substrate, a second pad neighboring the first pad and including a second groove supporting the center of the substrate, and a third pad spaced from the first pad, the second pad being disposed between the first and third pads, the third pad including a third groove supporting the other edge of the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for storing a substrate, the apparatus comprising: a main body storing the substrate; a first pad located at a bottom of the main body, the first pad including a plurality of first grooves, the first grooves extending in an elongation direction; a second pad located at the bottom of the main body, the second pad being spaced apart from and neighboring the first pad, the second pad including a plurality of second grooves, the second grooves extending in an elongation direction parallel to the elongation direction of the first grooves; and a third pad located at the bottom of the main body, the third pad being spaced from the first pad, the second pad being disposed between the first pad and the third pad, the third pad including a plurality of third grooves, the third grooves extending in an elongation direction parallel to the elongation direction of the first grooves and the second grooves, wherein: the first pad, the second pad, and the third pad are all on a same plane, a virtual straight line centered in one of the grooves of the first pad and extending in a direction parallel to the elongation direction of the grooves of the first pad is centered in one of the grooves of the third pad and is not centered in any of the grooves of the second pad. 2. The apparatus of claim 1 , wherein each of the first, second and third grooves is formed by neighboring slope faces. 3. The apparatus of claim 1 , further comprising a storage cover covering the main body and including a supporting groove for supporting one edge of the substrate. 4. The apparatus of claim 3 , wherein the supporting groove has a rectangular form.

Assignees

Inventors

Classifications

  • characterised by shock absorbing elements, e.g. retainers or cushions · CPC title

  • H10P72/15Primary

    Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls · CPC title

  • for glass sheets · CPC title

  • H10P72/10Primary

    using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] · CPC title

  • Electricity · mapped topic

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What does patent US9184075B2 cover?
An apparatus for storing a substrate on which a pattern is formed includes a main body storing the substrate, a first pad located at the bottom of the main body and including a first groove supporting one edge of the substrate, a second pad neighboring the first pad and including a second groove supporting the center of the substrate, and a third pad spaced from the first pad, the second pad be…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/15. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).