Alpha,Beta-UNSATURATED AMIDE COMPOUND
US-2021155612-A1 · May 27, 2021 · US
US9146470B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9146470-B2 |
| Application number | US-201414532134-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 4, 2014 |
| Priority date | Sep 30, 2011 |
| Publication date | Sep 29, 2015 |
| Grant date | Sep 29, 2015 |
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A photoacid generator compound has the formula (I): [A-(CHR 1 ) p ] k -(L)-(CH 2 ) m —(C(R 2 ) 2 ) n SO 3 − Z + (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C 5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R 1 is H, a single bond, or a substituted or unsubstituted C 1-30 alkyl group, wherein when R 1 is a single bond, R 1 is covalently bonded to a carbon atom of A, each R 2 is independently H, F, or C 1-4 fluoroalkyl, wherein at least one R 2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C 1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.
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The invention claimed is: 1. A method of forming an electronic device comprising: (a) applying a layer of a photoresist composition on a surface of a substrate; (b) patternwise exposing the photoresist composition layer to activating radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image, wherein the photoresist composition comprises: an acid-sensitive polymer, and a compound having the formula (I): [A-(CHR 1 ) p ] k -(L)-(CH 2 ) m —(C(R 2 ) 2 ) n SO 3 − Z + (I) wherein A is a substituted or unsubstituted, polycyclic, or fused polycyclic C 5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R 1 is H, a single bond, or a substituted or unsubstituted C 1-30 alkyl group, wherein when R 1 is a single bond, R 1 is covalently bonded to a carbon atom of A, each R 2 is independently H, F, or C 1-4 fluoroalkyl, wherein at least one R 2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C 1-30 sulfonate or sulfonamide-containing group, Z + is an organic or inorganic cation, and p is an integer of 0 to 10, k is 1 or 2, m is an integer of 2-10, and n is an integer of 1 to 10. 2. The method of claim 1 , wherein the compound having the formula (I) has the formula (IIa) or (IIb): A-(CHR 1 ) p —O—SO 2 —(CH 2 ) m —(C(R 2 ) 2 ) n —SO 3 − Z + (IIa) A-(CHR 1 ) p —SO 2 —O—(CH 2 ) m —(C(R 2 ) 2 ) n —SO 3 − Z + (IIb) wherein A, R 1 , R 2 p, m, n, and Z + are as defined for formula (I). 3. The method of claim 1 , wherein the compound having the formula (I) has the formula (IIIa) or (IIIb): A-(CHR 1 ) p —N(R 3 )—SO 2 —(CH 2 ) m —(C(R 2 ) 2 ) n —SO 3 − Z + (IIIa) A-(CHR 1 ) p —SO 2 —N(R 3 )—(CH 2 ) m —(C(R 2 ) 2 ) n —SO 3 − Z + (IIIb) wherein A, R 1 , R 2 p, m, n, and Z + are as defined for formula (I), and R 3 is H, a C 1-20 alkyl group, or A-(CHR 1 ) p —. 4. The method of claim 1 , wherein the compound having the formula (I) has the formula (IV), (V), (VI), (VII), (VIII), (IX), (X), (XI), or (XII): wherein Z + is as defined in formula (I). 5. The method of claim 1 , wherein Z + is a cation of the formula (XIII) wherein R 4 and R 5 are independently substituted or unsubstituted C 1-20 alkyl, C 1-20 fluoroalkyl, C 3-20 cycloalkyl, C 3-20 fluorocycloalkyl, C 2-20 alkenyl, C 2-20 fluoroalkenyl, C 6-20 aryl, C 6-20 fluoroaryl, C 5-20 heteroaryl, C 7-20 aralkyl, C 7-20 fluoroaralkyl, C 6-20 heteroaralkyl, where R 4 and R 5 are separate or connected by a single bond, and Ar is a C 5-30 aromatic-containing group. 6. The method of claim 5 , wherein the cation is of the formula (XIV), (XV), or (XVI): wherein R 4 and R 5 are independently substituted or unsubstituted C 1-20 alkyl, C 1-20 fluoroalkyl, C 3-20 cycloalkyl, C 3-20 fluorocycloalkyl, C 2-20 alkenyl, C 2-20 fluoroalkenyl, C 6-20 aryl, C 6-20 fluoroaryl, C 5-20 heteroaryl, C 7-20 aralkyl, C 7-20 fluoroaralkyl, or C 6-20 heteroaralkyl, where R 4 and R 5 are separate or connected by a single bond; R 6 , R 7 , R 8 and R 9 are each independently H, a halogen, C 1-20 alkyl, C 1-20 fluoroalkyl, C 1-20 alkoxy, C 1-20 fluoroalkoxy, C 1-20 thioalkoxy, C 1-20 fluorothioalkoxy, C 1-20 alkoxycarbonyl, C 1-20 fluoroalkoxycarbonyl, C 1-20 thioalkoxycarbonyl, C 1-20 fluorothioalkoxycarbonyl, C 3-20 cycloalkyl, C 3-20 fluorocycloalkyl, C 3-20 cycloalkoxy, C 3-20 fluorocycloalkoxy, C 2-20 alkenyl, C 2-20 fluoroalkenyl, C 6-20 aryl, C 6-20 fluoroaryl, C 6-20 aryloxy, C 6-20 fluoroaryloxy, C 5-20 heteroaryl, C 5-20 heteroaryloxy, C 5-20 heteroaryloxy, C 7-20 aralkyl, C 7-20 fluoroaralkyl, C 7-20 aralkyloxy C 7-20 fluoroaralkyloxy, or C 6-20 heteroaralkyl, or C 6-20 heteroaralkyloxy, wherein R 6 , R 7 , R 8 and R 9 are each independently unsubstituted or further substituted to include an acid-labile group, a base-labile group, or a base-soluble group, and q is an integer of 1 to 5, r is an integer of 0 to 3, s is an integer of 0 to 4, t is an integer of 0 to 4, and a is an integer of 0 to 4. 7. The method of claim 6 , wherein Z + is of the formula (XVII), (XVIII), (XIX), or (XX): wherein R 10 , R 11 , R 12 and R 14 are independently H, a halogen, C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, C 1-10 fluoroalkoxy, C 3-10 cycloalkyl, C 3-10 fluorocycloalkyl, C 3-10 cycloalkoxy, or C 3-10 fluorocycloalkoxy, R 13 is H, C 1-10 alkyl, C 1-10 fluoroalkyl, C 3-10 cycloalkyl, or C 3-10 fluorocycloalkyl, and a and b are each independently 1 or 2.
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