Magnetoresistive sensor, related manufacturing method, and related electronic device
US-9450178-B2 · Sep 20, 2016 · US
US9105568B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9105568-B2 |
| Application number | US-201314104934-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 12, 2013 |
| Priority date | Dec 14, 2012 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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A semiconductor device including: a semiconductor body having a first side and a second side opposite to one another; a first barrier element, which extends over the first side of the semiconductor body and is made of a first material configured to act as barrier against metal ions, for example chosen from among titanium, tantalum, titanium alloys or compounds, tantalum alloy; a magnetic element, which extends over the first barrier layer and is made of a second material having magnetic properties, for example a ferromagnetic material; a second barrier element, which extends over the magnetic layer and is made of a third material configured to act as barrier against metal ions, for example chosen from among titanium, tantalum, titanium alloys or compounds, tantalum alloys or compounds. The first and second barrier elements form a top encapsulating structure and a bottom encapsulating structure for the magnetic element.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a semiconductor device comprising the steps of: (a) providing a semiconductor body having a first side and a second side opposite the first side; (b) forming, on the first side of the semiconductor body, a first barrier element comprising a first material configured to act as barrier against metal ions; (c) forming, on the first barrier layer, a magnetic element comprising a second material having magnetic properties; (d) for…
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