Lithographic apparatus and device manufacturing method

US9099501B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9099501-B2
Application numberUS-90193910-A
CountryUS
Kind codeB2
Filing dateOct 11, 2010
Priority dateJun 28, 2005
Publication dateAug 4, 2015
Grant dateAug 4, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

First claim

Opening claim text (preview).

The invention claimed is: 1. A lithographic projection apparatus, comprising: a projection system arranged to project a pattern from a patterning device onto a substrate through a liquid; a gas knife configured to provide gas to a surface to be dried; and an extractor positioned adjacent the gas knife to remove gas, liquid, or both, wherein an outlet of the gas knife and an inlet of the extractor are formed in a substantially flat surface, the distance between the inlet of t…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9099501B2 cover?
A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
Who is the assignee on this patent?
Kemper Nicolaas Rudolf, Donders Sjoerd Nicolaas Lambertus, Hoogendam Christiaan Alexander, and 3 more
What technology area does this patent fall under?
Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 04 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).