Heating apparatus, coating apparatus and heating method

Patent metadata

Field	Value
Publication number	US-9027504-B2
Application number	US-201213484625-A
Country	US
Kind code	B2
Filing date	May 31, 2012
Priority date	Jun 2, 2011
Publication date	May 12, 2015
Grant date	May 12, 2015

Abstract

A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.

First claim

What is claimed is:

1. A heating apparatus comprising:
a first accommodation part provided with a first heating part;
a second accommodation part provided with a second heating part, wherein
the first accommodation part is movable substantially in parallel to the second accommodation part and is capable of being superimposed on the second accommodation part to form a chamber in which the first heating part and the second heating part are disposed, wherein
the first heating part and the second heating part are configured to have a substrate provided with a coating film disposed therebetween at a substrate position in the film thickness direction; and
a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part, wherein the distance control part comprises a moving part which moves at least one of the first heating part and the second heating part substantially in parallel to the first heating part and the second heating part in the film thickness direction.

2. The heating apparatus according to claim 1 , wherein the first heating part and the second heating part are arranged to be aligned in a vertical direction.

3. The heating apparatus according to claim 1 , which further comprises a substrate holding part which holds the substrate disposed at the substrate position.

4. The heating apparatus according to claim 3 , wherein either one of the first heating part and the second heating part which is disposed on a lower side of the substrate position in a vertical direction serves as the substrate holding part.

5. The heating apparatus according to claim 4 , wherein the distance control part controls at least one of the first distance and the second distance such that either one of the first heating part and the second heating part which is disposed on an upper side of the substrate position in a vertical direction does not come in contact with the coating film.

6. The heating apparatus according to claim 1 , wherein the chamber comprises a gas introduction part which introduces a gas.

7. The heating apparatus according to claim 6 , wherein the gas introduction part is provided to sandwich at least one of the first heating part and the second heating part between the gas introduction part and the substrate position.

8. The heating apparatus according to claim 1 , wherein the chamber comprises a gas exhaust part which exhausts a gas.

9. The heating apparatus according to claim 1 , wherein the chamber comprises a gas introduction part which introduces a gas and a gas exhaust part which exhausts the gas,
wherein the gas introduction part and the gas exhaust part are disposed to sandwich the substrate position.

10. A coating apparatus comprising:
a coating part which forms a coating film of a liquid material containing an oxidizable metal and a solvent on a substrate;
a heating part which heats the substrate having the coating film formed thereon; and
a transporting part which transports the substrate between the coating part and the heating part,
wherein a heating apparatus according to claim 1 is used as the heating part.

Assignees

• Miyamoto Hidenori
• Sahoda Tsutomu
• Tokyo Ohka Kogyo Co Ltd

Inventors

• Miyamoto Hidenori
• Sahoda Tsutomu

Classifications

• H10P72/3314

  Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0456 Primary

  in-line arrangement · CPC title

• H10F77/128

  comprising only Group I-II-IV-VI kesterite materials, e.g. Cu2ZnSnSe4 or Cu2ZnSnS4 · CPC title