Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system

Patent metadata

Field	Value
Publication number	US-9019466-B2
Application number	US-86285507-A
Country	US
Kind code	B2
Filing date	Sep 27, 2007
Priority date	Jul 24, 2007
Publication date	Apr 28, 2015
Grant date	Apr 28, 2015

Abstract

A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.

First claim

The invention claimed is:

1. A lithographic projection apparatus, comprising:
a projection system configured to project a beam of radiation onto a substrate;
a substrate table configured to hold the substrate;
a liquid retrieval system configured to retrieve liquid from a space between the projection system and the substrate table;
a liquid supply system configured to provide a cleaning liquid, which is chemically different from said liquid, in contact with at least part of an underside of the liquid retrieval system to remove contamination present on said underside; and
on a surface facing the projection system, a reflector configured to reflect a cleaning beam of radiation projected through the projection system onto the underside of the liquid retrieval system and through the cleaning liquid, the reflector having a surface receiving radiation from the projection system that is substantially co-planar with a surface, nearest the projection system, of the substrate when held by the substrate table, the reflector including a reflecting member configured to reflect substantially all radiation of the cleaning beam of radiation onto the underside of the liquid retrieval system.

2. The apparatus of claim 1 , wherein, in use, the reflecting member is at a distance from the projection system greater than the distance at which the substrate is imaged with the beam of radiation.

3. The apparatus of claim 1 , wherein the cleaning liquid comprising ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 10%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at a concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

4. The apparatus of claim 1 , wherein the reflector is positioned in a recess in a surface of the substrate table facing the projection system in which the substrate lies during imaging of the substrate.

5. The apparatus of claim 1 , wherein the reflector is formed on a surface of another substrate.

6. The apparatus of claim 1 , wherein the reflecting member comprises: a first facet configured to reflect incoming radiation projected through the projection system to a second facet of the reflecting member, the second facet being configured to reflect radiation reflected by the first facet onto the underside.

7. The apparatus of claim 1 , wherein the reflecting member comprises a convex reflective surface.

8. The apparatus of claim 1 , wherein, in use, the cleaning beam of radiation impinges on the surface receiving radiation from the projection system before being reflected by the reflecting member.

9. The apparatus of claim 1 , wherein, in use, the cleaning beam of radiation is focused substantially on the surface receiving radiation from the projection system so that the cleaning beam of radiation is divergent when the cleaning beam of radiation impinges on the reflecting member.

10. The apparatus of claim 1 , wherein, in use, the cleaning beam of radiation exiting the projection system passes the surface receiving radiation from the projection system before being reflected by the reflecting member to a position above the surface, nearest the projection system, of the substrate when held by the substrate table.

11. The apparatus of claim 1 , wherein the cleaning liquid is selected such that upon irradiation by the cleaning beam of radiation a cleaning power of the cleaning liquid is increased.

12. The apparatus of claim 1 , wherein, in use, the reflecting member is arranged at a distance from the projection system greater than a distance at which the surface receiving radiation from the projection system is located.

13. A lithographic projection apparatus, comprising:
a projection system configured to project a beam of radiation onto a substrate;
a substrate table configured to hold the substrate;
a liquid supply system configured to supply liquid to a space between the projection system and the substrate table; and
a reflective member for positioning under the projection system, the reflective member comprising: a first facet configured to reflect an incoming radiation beam projected through the projection system of the lithographic apparatus to a second facet of the reflective member, wherein, in use, after exiting the projection system, the incoming radiation beam is reflected first by the first facet before being reflected by the second facet, the second facet being configured to reflect the incoming radiation beam reflected by the first facet back in a direction with at least a major component in the direction of the incoming radiation to a position above the substrate when held by the substrate table, and wherein, in use, the reflective member is adapted to redirect substantially all radiation in the incoming radiation beam toward an underside of the liquid supply system,
wherein the liquid supply system is configured to provide a cleaning liquid, which is chemically different from said liquid, in contact with at least part of the underside of the liquid supply system to remove contamination present on said underside so that said radiation of the incoming radiation is redirected toward the underside through the cleaning liquid.

14. A method of irradiating an underside of a liquid supply system positioned around an end of a projection system in an immersion lithographic apparatus, the liquid supply system configured to provide liquid to a space between the projection system and a substrate table during substrate exposure, the method comprising: providing a cleaning liquid, which is chemically different from said liquid, in contact with at least part of the underside of the liquid supply system to remove contamination present on said underside; positioning a reflector under the projection system such that a cleaning beam of radiation projected through the projection system onto the reflector is reflected onto the underside of the liquid supply system and through the cleaning liquid, the reflector having a surface receiving radiation from the projection system that is substantially co-planar with a surface, nearest the projection system, of a substrate, the reflector including a reflecting member configured to reflect substantially all radiation of the cleaning beam of radiation onto the underside of the liquid supply system.

15. The method of claim 14 , wherein the reflector is on a surface of a substrate table facing the projection system.

16. The method of claim 15 , wherein the position of the reflector on the surface of the substrate table is a position next to a recess to hold the substrate.

17. The method of claim 15 , wherein the reflector is in a recess to hold the substrate during imaging.

18. The method of claim 15 , wherein the positioning includes moving the reflector, in a direction substantially parallel to the optical axis of the projection system, away from the projection system.

19. The method of claim 14 , wherein the reflector reflects the beam such that it is focused on only a porous member or only on an object radially inwardly, relative to the optical axis of the projection system, of the outer edge of the porous member.

20. The method of claim 14 , wherein the reflector reflects the beam off at least two facets.

21. The method of claim 20 , wherein a first facet of the at least two facets reflects the beam in a direction with at least a major component radially outwardly and perpendicular to the optical axis of the projection system.

22. The method of clai

Assignees

• Leenders Martinus Hendrikus Antonius
• Van Dommelen Youri Johannes Laurentius Maria
• Jansen Hans
• Watso Robert Douglas
• De Jong Anthonius Martinus Cornelis Petrus
• Cromwijk Jan Willem
• Laursen Thomas
• Asml Netherlands Bv

Inventors

• Leenders Martinus Hendrikus Antonius
• Van Dommelen Youri Johannes Laurentius Maria
• Jansen Hans
• Watso Robert Douglas
• De Jong Anthonius Martinus Cornelis Petrus
• Cromwijk Jan Willem
• Laursen Thomas

Classifications

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70925 Primary

  Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title