Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
US8999613B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999613-B2 |
| Application number | US-201313959427-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 5, 2013 |
| Priority date | Dec 1, 2011 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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Official abstract text for this publication.
Provided are a mask, a method of manufacturing the same, a light irradiation device, a method of radiating light, and a method of manufacturing an orientationally ordered photo-alignment layer. By the mask, collimated light or nearly collimated light may be irradiated with uniform illumination to a surface of an object to be irradiated. Further, by the mask, light may be effectively incident even on the object to be irradiated in the curved shape.
Opening claim text (preview).
The invention claimed is: 1. A device, comprising: an apparatus configured to position an object to be irradiated opposite a mask, the mask comprising: a transparent supporting structure having a surface with a curved shape; and a metal layer having at least one opening to guide light to the object, and having a surface with the curved shape of the transparent supporting structure, and wherein a width of the at least one opening is 5 or more times a distance between the mask…
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