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Component of substrate processing apparatus and method for forming a film thereon
US8999475B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999475-B2 |
| Application number | US-35521009-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 16, 2009 |
| Priority date | Jan 22, 2008 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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Abstract
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A component of a substrate processing apparatus that performs plasma processing on a substrate includes a base mainly formed of an aluminum alloy containing silicon. A film is formed on the surface of the base by an anodic oxidation process which includes connecting the component to an anode of a power supply and immersing the component in a solution mainly formed of an organic acid. The film is impregnated with ethyl silicate.
First claim
Opening claim text (preview).
What is claimed is: 1. A component of a substrate processing apparatus that performs plasma processing on a substrate, the component comprising: an aluminum base mainly formed of an aluminum alloy containing silicon; and an alumite film having heat resistance to heat applied when the plasma processing is performed and including a barrier layer and a porous layer formed on the barrier layer such that the porous layer has a plurality of pores each having an opening passage, the al…
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Electricity · mapped topic
- C25D11/005Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
- C25D21/02Primary
Chemistry & Metallurgy · mapped topic
- C25D11/02Primary
Chemistry & Metallurgy · mapped topic
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- What does patent US8999475B2 cover?
- A component of a substrate processing apparatus that performs plasma processing on a substrate includes a base mainly formed of an aluminum alloy containing silicon. A film is formed on the surface of the base by an anodic oxidation process which includes connecting the component to an anode of a power supply and immersing the component in a solution mainly formed of an organic acid. The film i…
- Who is the assignee on this patent?
- Mitsuhashi Koji, Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification C25D11/005. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).