Vibration Measurement Device
US-2024410745-A1 · Dec 12, 2024 · US
Methods and apparatus for sensing a substrate in a chamber
US8994950B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8994950-B2 |
| Application number | US-201414146503-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 2, 2014 |
| Priority date | Aug 16, 2011 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.
First claim
Opening claim text (preview).
What is claimed is: 1. An apparatus for sensing a substrate in a chamber, comprising: a base assembly comprising: an outer housing, a radiation source array located within the outer housing and configured to emit radiation of at least two different wavelengths, and a base mounting member having one or more apertures and configured to couple to a view port of a chamber; a sensor assembly coupled to the base assembly and comprising: one or more sensors configured to detect…
Assignees
Inventors
Classifications
- H10P72/0606Primary
Electricity · mapped topic
- G01N21/55Primary
Physics · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8994950B2 cover?
- The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a l…
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0606. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).