Wafer processing method
US-2024395620-A1 · Nov 28, 2024 · US
US8993413B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993413-B2 |
| Application number | US-201213708358-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 7, 2012 |
| Priority date | Feb 2, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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A method of manufacturing a semiconductor device includes the steps of preparing a semiconductor wafer having a thick portion in an outer circumferential end portion and a thin portion in a central portion, attaching a support material to one surface of the semiconductor wafer, dividing the semiconductor wafer into the thick portion and the thin portion, and cutting the thin portion, after the division, while supporting the thin portion by the support material.
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a semiconductor device, comprising the steps of: preparing a semiconductor wafer by removing material from a back surface located opposite to a main surface to form a thick portion in an outer circumferential end portion and a thin portion in a central portion; attaching a support material to said back surface of said semiconductor wafer across said thin portion and said thick portion with the support material extending across an…
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