Polishing tool, polishing system and method of polishing
US-2024342850-A1 · Oct 17, 2024 · US
Slurry supply system for CMP process
US8992287B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8992287-B2 |
| Application number | US-201113308706-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 1, 2011 |
| Priority date | Dec 1, 2011 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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The present disclosure relates to a slurry distribution system having a distribution tube connected between a mixing tank and a CMP tool. The mixing tank is configured to generate a polishing mixture comprising a diluted slurry having abrasive particles that enable mechanical polishing of a workpiece. The polishing mixture is transported between the mixing tank and a CMP tool by way of a transport piping. An energy source, in communication with the transport piping, transfers energy to the abrasive particles within the polishing mixture, thereby preventing accumulation of the abrasive particles within the transport piping.
First claim
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What is claimed is: 1. A slurry distribution system for a chemical mechanical polishing tool, comprising: a mixing tank configured to generate a polishing mixture comprising a diluted slurry mixture having abrasive particles that enable mechanical polishing of a workpiece; a transport piping configured to transport the polishing mixture between the mixing tank and a chemical mechanical polishing (CMP) tool, wherein the transport piping comprises a first tube and a second tube;…
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Frequently asked questions
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- What does patent US8992287B2 cover?
- The present disclosure relates to a slurry distribution system having a distribution tube connected between a mixing tank and a CMP tool. The mixing tank is configured to generate a polishing mixture comprising a diluted slurry having abrasive particles that enable mechanical polishing of a workpiece. The polishing mixture is transported between the mixing tank and a CMP tool by way of a transp…
- Who is the assignee on this patent?
- Wang Sheng-Chen, Wu Feng-Inn, Tsai Chih-Hung, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification B24B57/02. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).