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Measurement mark, method for measurement, and measurement apparatus
US8976356B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8976356-B2 |
| Application number | US-201313944297-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 17, 2013 |
| Priority date | Feb 28, 2013 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
According to one embodiment, a measurement mark includes: a first line pattern, first lines extending in a first direction, the first lines arranged in a second direction in the first line pattern, the first line pattern capable of forming a first moire pattern by overlapping with an arrangement pattern including a pattern, and a first polymer and a second polymer being alternately arranged in the pattern; a second line pattern, second lines extending in the first direction, the second lines being arranged in the second direction in the second line pattern, the second line pattern capable of forming a second moire pattern by overlapping with the arrangement pattern; and a reference pattern with a reference position configured to assess a first shift amount from the reference position of the first moire pattern and a second shift amount from the reference position of the second moire pattern.
First claim
Opening claim text (preview).
What is claimed is: 1. A measurement mark comprising: a first line pattern provided on an underlayer, a plurality of first lines extending in a first direction, the plurality of first lines being arranged in a second direction crossing the first direction in the first line pattern, the first line pattern forming a first moire pattern by overlapping with an arrangement pattern including a pattern, and a first polymer and a second polymer being alternately arranged in the pattern;…
Assignees
Inventors
Classifications
- H10P74/203Primary
Electricity · mapped topic
- G03F7/0002Primary
Physics · mapped topic
- H01L22/12Primary
Electricity · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8976356B2 cover?
- According to one embodiment, a measurement mark includes: a first line pattern, first lines extending in a first direction, the first lines arranged in a second direction in the first line pattern, the first line pattern capable of forming a first moire pattern by overlapping with an arrangement pattern including a pattern, and a first polymer and a second polymer being alternately arranged in …
- Who is the assignee on this patent?
- Toshiba Kk
- What technology area does this patent fall under?
- Primary CPC classification H10P74/203. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).