Apparatus for fabricating blank mask and method of fabricating the same
US-2024248390-A1 · Jul 25, 2024 · US
Photomask cleaning device
US8973199B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8973199-B2 |
| Application number | US-201313761236-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 7, 2013 |
| Priority date | Nov 19, 2012 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.
First claim
Opening claim text (preview).
What is claimed is: 1. A photomask cleaning device for cleaning photomasks, comprising: a fluid dispenser including a centrally arranged direct dispensing unit and at least one oblique dispensing unit flanking the direct dispensing unit for dispensing fluids towards a photomask; a scrubbing unit disposed above the direct dispensing unit for cleaning the photomask; a cover disposed on the direct dispensing unit for securing the scrubbing unit to the direct dispensing unit; a…
Assignees
Inventors
Classifications
- G03F1/82Primary
Physics · mapped topic
Electricity · mapped topic
- H10P76/204Primary
Electricity · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US8973199B2 cover?
- A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the s…
- Who is the assignee on this patent?
- Gudeng Prec Ind Co Ltd, Gudeng Prec Ind Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F1/82. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).