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Pattern measurement device and pattern measurement method
US8959461B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8959461-B2 |
| Application number | US-201214233003-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 23, 2012 |
| Priority date | Sep 8, 2011 |
| Publication date | Feb 17, 2015 |
| Grant date | Feb 17, 2015 |
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Abstract
Official abstract text for this publication.
A pattern measurement device includes: a storage section storing mask edge data of a circuit pattern and image data obtained by imaging the circuit pattern; an SEM contour extracting section receiving the image data, SEM contour of the circuit pattern, and cause an exposure simulator to generate estimated SEM contour data of an estimated SEM contour on the basis of the mask edge data and SEM contour data of the extracted SEM contour; a shape classifying section receiving the mask edge data, the SEM contour data, and the estimated contour data to classify the SEM contour data and the estimated SEM contour data into a one-dimensionally shaped contour and a two-dimensionally shaped contour; and an SEM contour sampling section receiving the SEM contour data and the estimated SEM contour data to sample the SEM contour data on the basis of types of the one-dimensionally and two-dimensionally shaped contours.
First claim
Opening claim text (preview).
The invention claimed is: 1. A pattern measurement device comprising: a storage section configured to store mask edge data of a circuit pattern of a semiconductor and image data obtained by imaging the circuit pattern; an SEM contour extracting section configured to receive the image data, extract a scanning electron microscope contour of the circuit pattern, and cause an exposure simulator to generate data of an estimated SEM contour on the basis of the mask edge data and data…
Assignees
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Classifications
Electricity · mapped topic
- G01B15/04Primary
Physics · mapped topic
Electricity · mapped topic
Physics · mapped topic
- H01J37/261Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8959461B2 cover?
- A pattern measurement device includes: a storage section storing mask edge data of a circuit pattern and image data obtained by imaging the circuit pattern; an SEM contour extracting section receiving the image data, SEM contour of the circuit pattern, and cause an exposure simulator to generate estimated SEM contour data of an estimated SEM contour on the basis of the mask edge data and SEM co…
- Who is the assignee on this patent?
- Shibahara Takuma, Oikawa Michio, Hojo Yutaka, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification G01B15/04. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).