Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Self-topcoating resist for photolithography
US8945808B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945808-B2 |
| Application number | US-38073106-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 28, 2006 |
| Priority date | Apr 28, 2006 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
Official abstract text for this publication.
Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.
First claim
Opening claim text (preview).
What is claimed is: 1. A resist composition comprising: a) a photoresist polymer that does not comprise a silsesquioxane polymer; b) at least one photoacid generator; c) a solvent; and d) a resist additive compound including a polymer, oligomer or cage structure having the following structure A: wherein, each Z 1 , Z 2 , and Z 3 independently represents a membe…
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- G03F7/2041Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8945808B2 cover?
- Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.
- Who is the assignee on this patent?
- David Robert Allen, Brock Phillip Joe, Larson Carl E, and 6 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/2041. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).