Photoresist compositions and methods of use in high index immersion lithography
US-9250529-B2 · Feb 2, 2016 · US
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Sanders Daniel Paul patents
Sanders Daniel Paul holds 4 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 4 |
| Recent patents | 0 |
| First publication | Feb 3, 2015 |
| Latest publication | Feb 2, 2016 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
US-9223217-B2 · Dec 29, 2015 · US
Sulfonamide-containing photoresist compositions and methods of use
US-9223209-B2 · Dec 29, 2015 · US
Self-topcoating resist for photolithography
US-8945808-B2 · Feb 3, 2015 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Photoresist compositions and methods of use in high index immersion lithography
US-9250529-B2 · Feb 2, 2016 · US
Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
US-9223217-B2 · Dec 29, 2015 · US
Sulfonamide-containing photoresist compositions and methods of use
US-9223209-B2 · Dec 29, 2015 · US
Self-topcoating resist for photolithography
US-8945808-B2 · Feb 3, 2015 · US
Top CPC classifications
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| G03F7/2041 | 4 |
| G03F7/0046 | 4 |
| G03F7/0392 | 4 |
| G03F7/0397 | 3 |
| G03F7/0045 | 3 |
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Physics | 4 |
| Chemistry & Metallurgy | 1 |