Cooling system for processing chamber
US-2024393018-A1 · Nov 28, 2024 · US
Plasma processing apparatus, and maintenance method and assembling method of the same
US8945340B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945340-B2 |
| Application number | US-70514110-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 12, 2010 |
| Priority date | Feb 12, 2009 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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A plasma processing apparatus includes a processing chamber that converts a processing gas introduced from a gas supply source into plasma and performs plasma processing on a target object, an exhaust chamber that communicates with the inside of the processing chamber to exhaust a gas converted into plasma from the processing chamber, and a blocking cover that is provided in the exhaust chamber to block communication between the inside of the processing chamber and the inside of the exhaust chamber.
First claim
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What is claimed is: 1. A plasma processing apparatus comprising: a processing chamber that converts a processing gas introduced from a gas supply source into plasma and performs plasma processing on a target object; an exhaust chamber that communicates with the inside of the processing chamber to exhaust a gas converted into plasma from the processing chamber; a blocking cover that is provided in the exhaust chamber to block communication between the inside of the processing c…
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Electricity · mapped topic
Cross-Sectional Technologies · mapped topic
- H01J37/32522Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8945340B2 cover?
- A plasma processing apparatus includes a processing chamber that converts a processing gas introduced from a gas supply source into plasma and performs plasma processing on a target object, an exhaust chamber that communicates with the inside of the processing chamber to exhaust a gas converted into plasma from the processing chamber, and a blocking cover that is provided in the exhaust chamber…
- Who is the assignee on this patent?
- Saito Masashi, Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification H01J37/32522. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).