Metal grid in backside illumination image sensor chips and methods for forming the same

Patent metadata

Field	Value
Publication number	US-8940574-B2
Application number	US-201213449019-A
Country	US
Kind code	B2
Filing date	Apr 17, 2012
Priority date	Apr 17, 2012
Publication date	Jan 27, 2015
Grant date	Jan 27, 2015

Abstract

A method includes forming a plurality of image sensors on a front side of a semiconductor substrate, and forming a dielectric layer on a backside of the semiconductor substrate. The dielectric layer is over the semiconductor substrate. The dielectric layer is patterned into a plurality of grid-filling regions, wherein each of the plurality of grid-filling regions overlaps one of the plurality of image sensors. A metal layer is formed on top surfaces and sidewalls of the plurality of grid-filling regions. The metal layer is etched to remove horizontal portions of the metal layer, wherein vertical portions of the metal layer remain after the step of etching to form a metal grid. A transparent material is filled into grid openings of the metal grid.

First claim

What is claimed is:

1. A method comprising:
forming a plurality of image sensors on a front side of a semiconductor substrate, wherein the plurality of image sensors forms an array;
forming a dielectric layer over a backside of the semiconductor substrate;
patterning the dielectric layer into a plurality of grid-filling regions, wherein each of the plurality of grid-filling regions overlaps one of the plurality of image sensors, and wherein the step of patterning comprises removing first portions of the dielectric layer that overlap first alternating ones of the plurality of image sensors in each row and each column of the array;
forming a metal layer on top surfaces and sidewalls of the plurality of grid-filling regions;
etching the metal layer to remove the metal layer on the top surface of each grid-filling region thereby forming a metal grid on sidewalls of the plurality of grid-filling regions, wherein the metal grid comprises a first plurality of metal features continuously extending through a plurality of rows of the array, and a second plurality of metal features continuously extending through a plurality of columns of the array, and wherein the first plurality of metal features and the second plurality of metal features cross each other;
filling a transparent material into grid openings of the metal grid, wherein the transparent material is a clear-colored material; and
forming a plurality of color filters over the metal grid and the transparent material.

2. The method of claim 1 , wherein the plurality of grid-filling regions has a pattern of one of the white color or black color of a checkerboard.

3. The method of claim 1 , wherein a distance between two neighboring ones of the plurality of grid-filling regions is substantially equal to a sum of a width of one of the plurality of grid-filling regions and two times a thickness of the metal layer.

4. The method of claim 1 , wherein the step of forming the metal layer is performed using a conformal deposition method.

5. The method of claim 1 , wherein in the step of filling the transparent material into the grid openings of the metal grid, the grid openings are filled with a same material as the plurality of grid-filling regions.

6. The method of claim 1 , wherein each of the grid openings overlaps one of the plurality of image sensors.

7. The method of claim 1 , wherein the transparent material further covers the grid-filling regions and the metal grid.

8. A method comprising:
forming a plurality of image sensors on a front side of a semiconductor substrate, wherein the plurality of image sensors forms an array, and wherein the plurality of image sensors comprises a first and a second plurality of image sensors, wherein in each row and each column of the array, image sensors in the first and the second plurality of image sensors are allocated in an alternating layout;
forming a dielectric layer over a backside of the semiconductor substrate;
patterning the dielectric layer to form a first plurality of grid-filling regions, wherein the first plurality of grid-filling regions overlaps the first plurality of image sensors in the array, and wherein the second plurality of image sensors is not overlapped by remaining portions of the dielectric layer;
forming a metal layer on top surfaces and sidewalls of the first plurality of grid-filling regions;
etching the metal layer to remove horizontal portions of the metal layer, wherein vertical portions of the metal layer remain after the step of etching to form a metal grid; and
filling a clear-colored dielectric material into remaining grid openings of the metal grid not occupied by the first plurality of grid-filling regions to form second plurality of grid-filling regions, wherein the clear-colored dielectric material further comprises a top layer covering the first plurality of grid-filling regions, the second plurality of grid-filling regions, and the metal grid.

9. The method of claim 8 further comprising:
forming color filters and micro-lenses overlapping the first and the second plurality of grid-filling regions and the metal grid.

10. The method of claim 9 , wherein the first and the second plurality of grid-filling regions are disposed as having a checkerboard pattern.

11. The method of claim 9 , wherein the first and the second plurality of grid-filling regions have substantially a same top-view size.

12. The method of claim 8 , wherein a distance between two neighboring ones of the first plurality of grid-filling regions is substantially equal to a sum of a width of one of the first plurality of grid-filling regions and two times a thickness of the metal layer.

13. The method of claim 8 , wherein the step of forming the metal layer is performed using a conformal deposition method.

14. A method comprising:
forming a plurality of image sensors on a front side of a semiconductor substrate, wherein the plurality of image sensors forms an array;
forming a dielectric layer over a backside of the semiconductor substrate;
patterning the dielectric layer into a plurality of grid-filling regions, wherein the step of patterning comprises removing first portions of the dielectric layer that overlap first alternating ones of the plurality of image sensors in each row and each column of the array;
forming a metal layer on top surfaces and sidewalls of the plurality of grid-filling regions;
etching the metal layer to remove the metal layer on the top surface of each grid-filling region, wherein remaining portions of the metal layer forms a metal grid on sidewalls of the plurality of grid-filling regions, wherein the metal grid comprises a first plurality of metal features continuously extending through a plurality of rows of the array, and a second plurality of metal features continuously extending through a plurality of columns of the array, and wherein the first plurality of metal features and the second plurality of metal features cross each other; and
filling a transparent material into grid openings of the metal grid; and
forming a plurality of color filters over the metal grid and the transparent material.

15. The method of claim 14 , wherein each of the plurality of grid-filling regions has lateral dimensions smaller than pitches of the plurality of image sensors.

16. The method of claim 14 , wherein after the step of patterning the dielectric layer, spaces are formed in the metal grid, and wherein the spaces and the plurality of grid-filling regions are disposed in an alternating pattern in each row and each column of the metal grid.

17. The method of claim 14 , wherein a distance between two neighboring ones of the plurality of grid-filling regions is substantially equal to a sum of a width of one of the plurality of grid-filling regions and two times a thickness of the metal layer.

18. The method of claim 14 , wherein the step of forming the metal layer is performed using a conformal deposition method.

19. The method of claim 14 , wherein spaces between the plurality of grid-filling regions are further arranged to overlap additional alternating ones of each row and each column of the array.

20. The method of claim 1 , wherein during the patterning the dielectric layer, second portions of the dielectric layer that overlap second alternating ones of the plurality of image sensors in each row and each column of the array are not removed, and wherein the first and the second alternating ones of the plurality of image sensors in each row and each column of the array are allocated in an alternating l

Assignees

• Wang Chih-Chien
• Chang Chu-Wei
• Mo Wang-Pen
• Hsieh Hung-Chang
• Taiwan Semiconductor Mfg

Inventors

• Wang Chih-Chien
• Chang Chu-Wei
• Mo Wang-Pen
• Hsieh Hung-Chang

Classifications

• H10F39/8067

  Reflectors · CPC title

• H10F39/199

  Back-illuminated image sensors · CPC title

• H10F39/8053 Primary

  Colour filters · CPC title

• H10F39/12 Primary

  Image sensors · CPC title