Lid opening and closing device

US8936050B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8936050-B2
Application numberUS-201213420097-A
CountryUS
Kind codeB2
Filing dateMar 14, 2012
Priority dateMar 16, 2011
Publication dateJan 20, 2015
Grant dateJan 20, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A lid opening and closing device for a semiconductor manufacturing apparatus having a partition wall configured to divide a carrier conveying region and a substrate conveying region, the partition wall having a conveying gateway with an edge portion, includes an exhaust port configured to discharge therethrough an atmospheric gas from a closed space formed between a carrier making contact with the edge portion of the conveying gateway and an opening/closing door, and a purge gas injecting part provided in the opening/closing door. The purge gas injecting part is configured to enter the internal space of a carrier lid through an opening formed on the front surface of the carrier lid, to inject a purge gas into the internal space of the carrier lid and to discharge an atmospheric gas existing in the internal space of the carrier lid into the closed space through another opening of the carrier lid.

First claim

Opening claim text (preview).

What is claimed is: 1. A lid opening and closing device for a semiconductor manufacturing apparatus which comprises: a partition wall configured to divide a carrier conveying region and a substrate conveying region, the partition wall having a conveying gateway with an edge portion; a carrier including a carrier body and a carrier lid configured to removably engage with the carrier body, the carrier body having a substrate takeout opening with an edge part, the carrier lid havin…

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Frequently asked questions

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What does patent US8936050B2 cover?
A lid opening and closing device for a semiconductor manufacturing apparatus having a partition wall configured to divide a carrier conveying region and a substrate conveying region, the partition wall having a conveying gateway with an edge portion, includes an exhaust port configured to discharge therethrough an atmospheric gas from a closed space formed between a carrier making contact with …
Who is the assignee on this patent?
Sugawara Yudo, Tokyo Electron Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/3406. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).