System and method for printing interference patterns having a pitch in a lithography system

Patent metadata

Field	Value
Publication number	US-8934084-B2
Application number	US-44343106-A
Country	US
Kind code	B2
Filing date	May 31, 2006
Priority date	May 31, 2006
Publication date	Jan 13, 2015
Grant date	Jan 13, 2015

Abstract

An interferometric lithography system produces a pattern having a sharp field edge and minimal optical path length difference. Light passes through a beamsplitter into an input prism. The two beams produced by the beamsplitter are reflected off respective surfaces of the input prism toward a substrate prism. The substrate prism is symmetric to the input prism such that the incidence angle at an image plane is approximately equal to the beamsplitter diffraction angle. Alternatively, light passes through a beamsplitter into a prism. The two beams produced by the beamsplitter are reflected off respective surfaces of the prism toward an output surface of the prism, such that the incidence angle at the output surface is approximately equal to the beamsplitter diffraction angle. A plurality of these interferometers can be stacked, each being optimized for a given pitch, such that the stack provides a variable pitch interferometry system.

First claim

What is claimed is:

1. An interferometric lithography apparatus, comprising along an optical path:
a beam splitter to create at least two spatially coherent radiation beams;
a beam combiner adapted to redirect and combine the at least two spatially coherent radiation beams onto a surface of a substrate to form an interference pattern;
a field blade, at an object plane, that is separate from the beam splitter and located on, or downstream from, the beam splitter; and
a lens t…

Assignees

• Shmarev Yevgeniy Konstantinovich
• Asml Holding Nv

Inventors

• Shmarev Yevgeniy Konstantinovich

Classifications

• G03F7/70408 Primary

  Physics · mapped topic