Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Apparatus and methods for recovering fluid in immersion lithography
US8934080B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8934080-B2 |
| Application number | US-201213617251-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 14, 2012 |
| Priority date | Mar 18, 2008 |
| Publication date | Jan 13, 2015 |
| Grant date | Jan 13, 2015 |
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Abstract
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An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
First claim
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What is claimed is: 1. An immersion lithography apparatus comprising: a projection system having a final optical element; a movable stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of a substrate held on the stage, an immersion liquid being filled in the gap between the surface of the substrate and the final optical element; a first liquid recovery portion; a second liquid recovery portion…
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- G03F7/70341Primary
Physics · mapped topic
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- What does patent US8934080B2 cover?
- An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid…
- Who is the assignee on this patent?
- Poon Alex Ka Tim, Kho Leonard Wai Fung, Coon Derek, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 13 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).