Substrate processing method

Patent metadata

Field	Value
Publication number	US-2026002264-A1
Application number	US-202519246961-A
Country	US
Kind code	A1
Filing date	Jun 24, 2025
Priority date	Jun 27, 2024
Publication date	Jan 1, 2026
Grant date	—

Abstract

Provided is a method of improving a control time accuracy while a command signal is transmitted to a substrate processing apparatus from a controller, and a process stability while processing a substrate. A method of forming the film using it comprises inputting process control parameters into a first controller, downloading the process control parameters to a second controller from the first controller, and forming the film on the substrate.

First claim

1 . A method of forming a film on a substrate in a reactor, comprising:
loading a substrate in a reactor; inputting process control parameters into a first controller; downloading the process control parameters to a second controller from the first controller; and forming the film on the substrate by repeating a cycle comprising: applying a first power in a pulsed mode to the reactor from a power source while supplying a source gas and a reactant to the reactor through a valve unit from a gas source; and treating the film by applying a second power to the reactor from the power source while supplying the reactant to the reactor through the valve unit from the gas source, wherein the second controller controls the power source and the valve unit with the process control parameters.

2 . The method of claim 1 , wherein the first power is applied to the reactor while supplying the source gas, and supplying the source gas ends while applying the first power to the reactor.

3 . The method of claim 2 , further comprising purging the reactor after ending applying the first power and before applying the second power.

4 . The method of claim 1 , wherein the process control parameters comprise digital output signals.

5 . The method of claim 4 , wherein a control accuracy time of the digital output signals to the power source and the valve unit from the second controller is about 1 millisecond or below.

6 . The method of claim 1 , wherein the first power is applied with a duty ratio of between 10% and 50%.

7 . The method of claim 1 , wherein the first power is applied with an intensity of between about 100W and about 500W at high frequency of between about 10 MHz and about 30 MHz.

8 . The method of claim 1 , wherein the second power is applied in a continuous mode.

9 . The method of claim 8 , wherein the second power is applied with an intensity of between about 200W and about 800W at low frequency of between about 300 kHz and about 500 kHz, and with an intensity of between about 1,000W and about 2,000W at high frequency of between about 10 MHz and about 30 MHz.

10 . The method of claim 1 , wherein an impedance matching between the power source and the reactor is performed through a matching network, wherein the matching network comprises a plurality of electronically variable discrete capacitors.

11 . The method of claim 1 , wherein the film comprises at least one of a silicon oxide, a silicon nitride, a silicon oxynitride, a silicon oxycarbide, a silicon carbonitride, a silicon oxycarbonitride, or a mixture thereof.

12 . The method of claim 1 , wherein the source gas comprises a silicon.

13 . The method of claim 12 , wherein the source gas comprises at least one of (SiH 3 ) 2 NMe, (SiH 3 ) 2 NEt, (SiH 3 ) 2 N(iPr), (SiH 3 ) 2 N(tBu), SiH 3 NEt 2 , SiH 3 N(tBu) 2 , SiH 2 (NEt 2 ) 2 , SiH 2 (NMe 2 ) 2 , SiH 2 (NHtBu) 2 , SiH 2 (NHSiMe 3 ) 2 , SiH 3 N(iPr) 2 , Si(OEt) 4 , SiH(N(Me) 2 ) 3 , SiH 2 [N(Et)(Me)] 2 , Si 2 (NHEt) 6 , Si(NHEt) 4 , Si(CH 3 ) 4 , or a mixture thereof.

14 . The method of claim 1 , wherein the reactant comprises at least one of oxygen, nitrogen, or a mixture thereof.

15 . The method of claim 14 , wherein the reactant comprises at least one of O 2 , O 3 , N 2 , NO 2 , N 2 O, N 2 H 2 , NH 3 , NH 4 , or a mixture thereof.

16 . The method of claim 1 , wherein the film is formed at between about 200° C. and about 500° C.

17 . The method of claim 1 , wherein the reactant is supplied continuously throughout the cycle.

18 . The method of claim 1 , further comprising supplying an inert gas as a purge gas continuously throughout the cycle.

19 . A substrate processing apparatus to perform a method of claim 1 , comprising:
a reactor; a power source to apply a power to the reactor; a matching network to match an impedance between the reactor and the power source; a valve unit to control supplying a source gas and a reactant to the reactor from a gas source; a first controller with digital output signals and analog output signals input; and a second controller, wherein the second controller is downloaded with the digital output signals and the analog output signals from the first controller to control the substrate processing apparatus, wherein a control accuracy time of the digital output signals and the analog output signals to the substrate processing apparatus from the second controller is about 1 millisecond or below.

20 . The substrate processing apparatus of claim 19 , wherein the matching network comprises a plurality of electronically variable discrete capacitors.

Assignees

• Asm Ip Holding Bv

Inventors

• Han Seongmin
• Chun SeungJu
• Woo Sungjoo
• Baek Soohyun
• Jang Kyunghun
• Ko Kwangman
• Ryu Ingon
• Kim Hiechul

Classifications

• C23C16/45553

  characterized by the use of precursors specially adapted for ALD · CPC title

• C23C16/4408

  by purging residual gases from the reaction chamber or gas lines · CPC title

• C23C16/45536

  Use of plasma, radiation or electromagnetic fields · CPC title

• C23C16/52 Primary

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• C23C16/46

  characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title